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Transmission electron microscopy structure and platinum-like temperature coefficient of resistance in a ruthenate-based thick film resistor with copper oxide

dc.contributor.authorJiang, J. C.en_US
dc.contributor.authorCrosbie, Gary M.en_US
dc.contributor.authorTian, Weien_US
dc.contributor.authorCameron, K. K.en_US
dc.contributor.authorPan, Xiaoqingen_US
dc.date.accessioned2010-05-06T22:16:06Z
dc.date.available2010-05-06T22:16:06Z
dc.date.issued2000-07-15en_US
dc.identifier.citationJiang, J. C.; Crosbie, Gary M.; Tian, W.; Cameron, K. K.; Pan, X. Q. (2000). "Transmission electron microscopy structure and platinum-like temperature coefficient of resistance in a ruthenate-based thick film resistor with copper oxide." Journal of Applied Physics 88(2): 1124-1128. <http://hdl.handle.net/2027.42/70506>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70506
dc.description.abstractAs an alternative to thin-film platinum temperature sensor elements, thick film resistor ones are of interest for circuits which can withstand a near-engine environment. From a pyrochlore paste (DuPont 5091D), a close match is obtained (after firing) to the positive temperature coefficient of resistance (TCR) of Pt. Within the glassy matrix during 850 °C850 °C firing, needle-like RuO2RuO2 grains grow by a mechanism consistent with periodic bond chain theory. The acicular growth habit is attributed to a Cu2OCu2O additive, which is assumed to oxidize upon firing. The needles provide direct paths for metallic conduction and a characteristic positive TCR to the thick film in spite of having a low RuO2RuO2 volume fraction. © 2000 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent491182 bytes
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dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleTransmission electron microscopy structure and platinum-like temperature coefficient of resistance in a ruthenate-based thick film resistor with copper oxideen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationumFord Motor Company, 20000 Rotunda Drive, MD 3182 SRL Bldg., Dearborn, Michigan 48121-2053en_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationumFord Motor Company, 20000 Rotunda Drive, Dearborn, Michigan 48121-2053en_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70506/2/JAPIAU-88-2-1124-1.pdf
dc.identifier.doi10.1063/1.373786en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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