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Predicted elastic constants and critical layer thicknesses for cubic phase AlN, GaN, and InN on β‐SiC

dc.contributor.authorSherwin, M. E. (Marc E.)en_US
dc.contributor.authorDrummond, Timothy J.en_US
dc.date.accessioned2010-05-06T22:21:29Z
dc.date.available2010-05-06T22:21:29Z
dc.date.issued1991-06-15en_US
dc.identifier.citationSherwin, M. E.; Drummond, T. J. (1991). "Predicted elastic constants and critical layer thicknesses for cubic phase AlN, GaN, and InN on β‐SiC." Journal of Applied Physics 69(12): 8423-8425. <http://hdl.handle.net/2027.42/70563>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70563
dc.description.abstractElastic constants for zinc‐blende AlN, GaN, and InN have been estimated from the elastic constants of the wurtzite phase. This has been accomplished by recognizing that the crystal structures of the wurtzite and zinc‐blende phases are related by a simple rotation. This rotation was then applied to the elastic constants and a least‐squares fit is used to match the results. Using the zinc‐blende elastic constants the critical thickness of the nitrides on β‐SiC substrates was calculated. The critical thickness of a single overlayer of AlN was calculated to be 14.1 nm, and for GaN the critical thickness was found to be 0.7 nm. In the elastic continuum model used there was no solution for the critical thickness of InN.en_US
dc.format.extent3102 bytes
dc.format.extent332923 bytes
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dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titlePredicted elastic constants and critical layer thicknesses for cubic phase AlN, GaN, and InN on β‐SiCen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109‐2122en_US
dc.contributor.affiliationotherSandia National Laboratories, P.O. Box 5800, Albuquerque, New Mexico 87185en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70563/2/JAPIAU-69-12-8423-1.pdf
dc.identifier.doi10.1063/1.347412en_US
dc.identifier.sourceJournal of Applied Physicsen_US
dc.identifier.citedreferenceM. J. Paisley, Z. Sitar, J. B. Posthill, and R. F. Davis, J. Vac. Sci. Technol. A 7, 701 (1989).en_US
dc.identifier.citedreferenceM. Mizuta, S. Fujieda, Y. Matsumoto, and T. Kawamura, Jpn. J. Appl. Phys. 25, L945 (1986).en_US
dc.identifier.citedreferenceF. N. H. Robinson, Phys. Lett. 26A, 435 (1968).en_US
dc.identifier.citedreferenceR. M. Martin, Phys. Rev. B 6, 4546 (1972).en_US
dc.identifier.citedreferenceIn the paper by Martin, there was a typographical error in the definition of the Q matrix.en_US
dc.identifier.citedreferenceP. E. Van Camp, V. E. Van Doren, and J. T. Devreese, Phys. Rev. B 38, 9906 (1988).en_US
dc.identifier.citedreferenceP. E. Van Camp, V. E. Van Doren, and J. T. Devreese, Phys. Rev. B 41, 1598 (1990).en_US
dc.identifier.citedreferenceJ. W. Matthews and A. E. Blakeslee, J. Cryst. Growth 27, 118 (1974).en_US
dc.identifier.citedreferenceT. G. Andersson, Z. G. Chen, V. K. Kulakovskii, A. Uddin, and J. T. Vallin, Appl. Phys. Lett. 51, 752 (1987).en_US
dc.identifier.citedreferenceLandholt and Börnstein, Group III: Crystal and Solid State Physics (Springer, Berlin-Heidelberg, 1984), Vol. 18.en_US
dc.identifier.citedreferenceK. Tsubouchi and N. Mikoshiba, IEEE Trans. Sonics Ultrason. SU-32, 634 (1985).en_US
dc.identifier.citedreferenceV. A. Savastenko and A. U. Sheleg, Phys. Status Solidi A 48, K135 (1978).en_US
dc.identifier.citedreferenceA. U. Sheleg and V. A. Savastenko, Inorg. Mater. (USA) 15, 1257 (1979).en_US
dc.owningcollnamePhysics, Department of


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