Projection ablation lithography cathode for high-current, relativistic magnetron
dc.contributor.author | Jones, M. C. | en_US |
dc.contributor.author | Neculaes, V. B. | en_US |
dc.contributor.author | Gilgenbach, Ronald M. | en_US |
dc.contributor.author | White, W. M. | en_US |
dc.contributor.author | Lopez, Mike R. | en_US |
dc.contributor.author | Lau, Y. Y. | en_US |
dc.contributor.author | Spencer, Thomas A. | en_US |
dc.contributor.author | Price, D. | en_US |
dc.date.accessioned | 2010-05-06T22:38:45Z | |
dc.date.available | 2010-05-06T22:38:45Z | |
dc.date.issued | 2004-09 | en_US |
dc.identifier.citation | Jones, M. C.; Neculaes, V. B.; Gilgenbach, R. M.; White, W. M.; Lopez, M. R.; Lau, Y. Y.; Spencer, T. A.; Price, D. (2004). "Projection ablation lithography cathode for high-current, relativistic magnetron." Review of Scientific Instruments 75(9): 2976-2980. <http://hdl.handle.net/2027.42/70745> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/70745 | |
dc.description.abstract | Initial results are presented of an innovative cathode operating in a relativistic magnetron powered by an accelerator with parameters: −0.3 MV−0.3MV, 1–10 kA1–10kA, and 0.5 μs0.5μs pulse length. This cathode is fabricated by ablating a pattern on the cathode using a KrF laser. This projection ablation lithography (PAL) cathode has demonstrated fast current turn-on and microwave startup times have decreased from an average of 193 to 118 ns193to118ns. The pulselength of 1 GHz1GHz microwave oscillation has increased from a 144 ns144ns average to 217 ns217ns. With these improvements in microwave startup and pulse length, the microwave power has approximately remained the same compared to the previously used cloth cathodes. A new triple-azimuthal emission region is tested as means of prebunching the electrons (“cathode priming”) into the three spokes desired for pi mode operation in a six-cavity magnetron. The Tri-PAL cathode priming results in the fastest startup and highest efficiency of relativistic magnetron microwave generation. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 667513 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/octet-stream | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Projection ablation lithography cathode for high-current, relativistic magnetron | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Nuclear Engineering and Radiological Sciences Department, Intense Energy Beam Interaction Lab, University of Michigan, Ann Arbor, Michigan 48109-2104 | en_US |
dc.contributor.affiliationother | Air Force Research Laboratory, Phillips Research Lab, Kirtland AFB, New Mexico | en_US |
dc.contributor.affiliationother | Titan Corporation | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/70745/2/RSINAK-75-9-2976-1.pdf | |
dc.identifier.doi | 10.1063/1.1784561 | en_US |
dc.identifier.source | Review of Scientific Instruments | en_US |
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dc.owningcollname | Physics, Department of |
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