Show simple item record

Semiconductor detector for the selective detection of atomic hydrogen

dc.contributor.authorHarvey, K. C.en_US
dc.contributor.authorFehrenbach, C.en_US
dc.date.accessioned2010-05-06T22:42:26Z
dc.date.available2010-05-06T22:42:26Z
dc.date.issued1983-09en_US
dc.identifier.citationHarvey, K. C.; Fehrenbach, C. (1983). "Semiconductor detector for the selective detection of atomic hydrogen." Review of Scientific Instruments 54(9): 1117-1120. <http://hdl.handle.net/2027.42/70784>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70784
dc.description.abstractA semiconductor detector is described which responds to the atomic hydrogen in an atomic beam but is insensitive to molecular hydrogen. The hydrogen flux is measured through the change in conductivity of the semiconductor material which occurs when the hydrogen is chemisorbed. The atomic flux from a rf hydrogen discharge is used to determine the sensitivity of the detector. The minimum detectable signal is ∼109 hydrogen atoms mm−2 s−1. The detector has a response time of less than 2 ms.en_US
dc.format.extent3102 bytes
dc.format.extent378339 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleSemiconductor detector for the selective detection of atomic hydrogenen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumHarrison M. Randall Laboratory, The University of Michigan, Ann Arbor, Michigan 48109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70784/2/RSINAK-54-9-1117-1.pdf
dc.identifier.doi10.1063/1.1137526en_US
dc.identifier.sourceReview of Scientific Instrumentsen_US
dc.identifier.citedreferenceD. Brenner, Rev. Sci. Instrum. 40, 1234 (1969).en_US
dc.identifier.citedreferenceM. Cavallini, G. Gallinaro, and G. Scoles, Z. Naturforsch. Teil A 22, 413 (1967).en_US
dc.identifier.citedreferenceJ. T. M. Walraven and I. F. Silvera, Rev. Sci. Instrum. 53, 1167 (1982).en_US
dc.identifier.citedreferenceJ. C. Macfarlane, J. Vac. Sci. Technol. 5, 118 (1968).en_US
dc.identifier.citedreferenceK. Haberrecker, E. Mollwo, H. Schreiber, H. Hoinkes, H. Nahr, P. Lindner, and H. Wilsch, Nucl. Instrum. Methods 57, 22 (1967).en_US
dc.identifier.citedreferenceThermometrics, Edison, New Jersey 08817. A Thermoflake with a 1×1‐mm1×1‐mm cross section and a resistance of 1 MΩ1MΩ was used for most of this work.en_US
dc.identifier.citedreferenceR. De Waard and E. M. Wormser, Navy Bureau of Ordinance, NAVORD Report No. 5495, 1958.en_US
dc.identifier.citedreferenceJ. A. Giordmaine and T. C. Wang, J. Appl. Phys. 31, 463 (1960).en_US
dc.identifier.citedreferenceN. F. Ramsey, Molecular Beams (Clarendon, Oxford, 1956), p. 16.en_US
dc.identifier.citedreferenceI. Langmuir, J. Am. Chem. Soc. 40, 1361 (1918).en_US
dc.owningcollnamePhysics, Department of


Files in this item

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.