Mechanism of texture development in ion-beam-assisted deposition
dc.contributor.author | Dong, Liang | en_US |
dc.contributor.author | Srolovitz, David J. | en_US |
dc.date.accessioned | 2010-05-06T22:43:58Z | |
dc.date.available | 2010-05-06T22:43:58Z | |
dc.date.issued | 1999-07-26 | en_US |
dc.identifier.citation | Dong, L.; Srolovitz, D. J. (1999). "Mechanism of texture development in ion-beam-assisted deposition." Applied Physics Letters 75(4): 584-586. <http://hdl.handle.net/2027.42/70800> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/70800 | |
dc.description.abstract | We perform a series of atomistic simulations of ion-beam-assisted deposition (IBAD) to identify the mechanism by which ion beams select crystallographic texture. Simulations were devised to distinguish between two previously proposed mechanisms: (1) preferential sputtering of differently oriented grains and (2) preferential damage of differently oriented grains followed by grain-boundary migration. We show that while preferential sputtering is capable of producing texture change, it does so much more slowly than observed in IBAD. Simulations that include only differential damage produce structures which are nearly indistinguishable from those seen in IBAD. These results conclusively demonstrate that texture evolution during ion-beam-assisted deposition is dominated by differential damage and subsequent recrystallization.© 1999 American Institute of Physics. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 627682 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Mechanism of texture development in ion-beam-assisted deposition | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109-2136 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/70800/2/APPLAB-75-4-584-1.pdf | |
dc.identifier.doi | 10.1063/1.124449 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
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dc.owningcollname | Physics, Department of |
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