Relative fluorine concentrations in radio frequency/electron cyclotron resonance hybrid glow discharges
dc.contributor.author | Passow, Michael L. | en_US |
dc.contributor.author | Pender, J. T. P. | en_US |
dc.contributor.author | Brake, Mary L. | en_US |
dc.contributor.author | Sung, K. T. | en_US |
dc.contributor.author | Liu, Y. | en_US |
dc.contributor.author | Pang, S. W. | en_US |
dc.contributor.author | Elta, Michael E. | en_US |
dc.date.accessioned | 2010-05-06T22:53:26Z | |
dc.date.available | 2010-05-06T22:53:26Z | |
dc.date.issued | 1992-02-17 | en_US |
dc.identifier.citation | Passow, M. L.; Pender, J. T. P.; Brake, M. L.; Sung, K. T.; Liu, Y.; Pang, S. W.; Elta, M. E. (1992). "Relative fluorine concentrations in radio frequency/electron cyclotron resonance hybrid glow discharges." Applied Physics Letters 60(7): 818-820. <http://hdl.handle.net/2027.42/70900> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/70900 | |
dc.description.abstract | The relative concentration of atomic fluorine was measured in a radio frequency (rf) glow discharge and a modified electron cyclotron resonance microwave/rf hybrid discharge in CF4 using an actinometric technique. The dependence of fluorine concentration on rf and microwave power, pressure, flow, and excitation source are presented. Anomalous behavior with rf power at constant microwave power was observed when using the Ar 750‐nm line as the actinometric species. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 360871 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Relative fluorine concentrations in radio frequency/electron cyclotron resonance hybrid glow discharges | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Nuclear Engineering, The University of Michigan, Ann Arbor, Michigan 48109‐2104 | en_US |
dc.contributor.affiliationum | Solid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109‐2122 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/70900/2/APPLAB-60-7-818-1.pdf | |
dc.identifier.doi | 10.1063/1.107428 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
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dc.identifier.citedreference | M. L. Passow, Ph.D. thesis, University of Michigan, 1991. | en_US |
dc.identifier.citedreference | S. W. Pang, Y. Liu, and S. T. Sung, J. Vac. Sci. Technol. B 9, 3530 (1991). | en_US |
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dc.owningcollname | Physics, Department of |
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