Show simple item record

Charge control and mobility in AlGaN/GaN transistors: Experimental and theoretical studies

dc.contributor.authorZhang, Yifeien_US
dc.contributor.authorSmorchkova, I. P.en_US
dc.contributor.authorElsass, C. R.en_US
dc.contributor.authorKeller, Staciaen_US
dc.contributor.authorIbbetson, James P.en_US
dc.contributor.authorDenbaars, Stevenen_US
dc.contributor.authorMishra, Umesh K.en_US
dc.contributor.authorSingh, Jaspriten_US
dc.date.accessioned2010-05-06T22:55:59Z
dc.date.available2010-05-06T22:55:59Z
dc.date.issued2000-06-01en_US
dc.identifier.citationZhang, Yifei; Smorchkova, I. P.; Elsass, C. R.; Keller, Stacia; Ibbetson, James P.; Denbaars, Steven; Mishra, Umesh K.; Singh, Jasprit (2000). "Charge control and mobility in AlGaN/GaN transistors: Experimental and theoretical studies." Journal of Applied Physics 87(11): 7981-7987. <http://hdl.handle.net/2027.42/70927>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70927
dc.description.abstractIn this article we report on two dimensional sheet charge and mobility in GaN/AlGaN heterostructure field effect transistors. Both experimental and theoretical results are presented. Experimental results are reported on samples grown by metal organic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE). Theoretical studies are done to examine how spontaneous polarization and piezoelectric effect control the sheet charge density. The studies also focus on how interface roughness, aluminum mole fraction in the barrier and phonon scattering influence mobility. We find that interface roughness is a dominant source of scattering in the samples reported. Due to the variation in growth techniques we find that the MBE samples have a smoother interface compared to the MOCVD samples. By carefully fitting the experimental data we present results on interface roughness parameters for MBE and MOCVD samples. © 2000 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent143519 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleCharge control and mobility in AlGaN/GaN transistors: Experimental and theoretical studiesen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumApplied Physics Program, The University of Michigan at Ann Arbor, Ann Arbor, Michigan 48109-1120en_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, The University of Michigan at Ann Arbor, Ann Arbor, Michigan 48109-2122en_US
dc.contributor.affiliationotherDepartment of Electrical and Computer Engineering, University of California, Santa Barbara, California 93106en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70927/2/JAPIAU-87-11-7981-1.pdf
dc.identifier.doi10.1063/1.373483en_US
dc.identifier.sourceJournal of Applied Physicsen_US
dc.identifier.citedreferenceS. Nakamura, M. Senoh, N. Iwasa, S. Nagahama, T. Yamada, and T. Mukai, Jpn. J. Appl. Phys., Part 2 JAPLD834, L1332 (1995); S. Nakamura, M. Senoh, S. Nagahama, N. Iwasa, T. Yamada, T. Matsushita, Y. Sugimoto, and H. Kiyoku, Appl. Phys. Lett. APPLAB69, 3034 (1996).en_US
dc.identifier.citedreferenceG. E. Bulman et al., Electron. Lett. ELLEAK33, 1556 (1997).en_US
dc.identifier.citedreferenceM. P. Mack, A. Abare, M. Aizcorbe, P. Kozodoy, S. Keller, U. K. Mishra, L. Coldren, and S. DenBaars, MRS Internet J. Nitride Semicond. Res. MIJNF72, 41 (1997).en_US
dc.identifier.citedreferenceA. Kuramata, K. Domen, R. Soejima, K. Horino, S. Kubota, and T. Tanahashi, Jpn. J. Appl. Phys., Part 2 JAPLD836, L1130 (1997).en_US
dc.identifier.citedreferenceO. Aktas, Z. F. Fan, A. Botchkarev, S. N. Mohammad, M. Roth, T. Jenkins, L. Kehias, and H. Morkoc, IEEE Electron Device Lett. EDLEDZ18, 293 (1997).en_US
dc.identifier.citedreferenceM. S. Shur and M. A. Kahn, MRS Bull. MRSBEA22, 44 (1997).en_US
dc.identifier.citedreferenceY. F. Wu, S. Keller, P. Kozodoy, B. P. Keller, P. Parikh, D. Kapolnek, S. P. DenBaars, and U. K. Mishra, IEEE Electron Device Lett. EDLEDZ18, 290 (1997).en_US
dc.identifier.citedreferenceU. K. Mishra, Y. F. Wu, B. P. Keller, S. Keller, and S. P. DenBaars, IEEE Trans. Microwave Theory Tech. IETMAB46, 756 (1998).en_US
dc.identifier.citedreferenceR. Dimitrov, L. Wittmer, H. P. Felsl, A. Mitchell, O. Ambacher, and M. Stutzmann, Phys. Status Solidi A PSSABA168, R7 (1998).en_US
dc.identifier.citedreferenceF. Bernardini, V. Fiorentini, and D. Vanderbilt, Phys. Rev. B PRBMDO56, R10024 (1997).en_US
dc.identifier.citedreferenceW. Q. Chen and S. K. Hark, J. Appl. Phys. JAPIAU77, 5747 (1995).en_US
dc.identifier.citedreferenceO. Ambacher et al., J. Appl. Phys. JAPIAU85, 3222 (1999).en_US
dc.identifier.citedreferenceC.-K. Sun, S. Keller, T.-L. Chiu, G. Wang, M. S. Minsky, J. E. Bowers, and S. P. DenBaars, IEEE J. Sel. Top. Quantum Electron. IJSQEN3, 731 (1997).en_US
dc.identifier.citedreferenceI. P. Smorchkova et al., J. Appl. Phys. JAPIAU86, 4520 (1999).en_US
dc.identifier.citedreferenceA. Polian, M. Grimsditch, and I. Grzegory, J. Appl. Phys. JAPIAU79, 3343 (1996).en_US
dc.identifier.citedreferenceProperties of Group III Nitrides, edited by, J. H. Edgar (INSPEC, London, 1994).en_US
dc.identifier.citedreferenceY. Zhang and J. Singh, J. Appl. Phys. JAPIAU85, 587 (1999).en_US
dc.identifier.citedreferenceSee for example, D. K. Ferry, Semiconductors (Macmillan, New York, 1991).en_US
dc.owningcollnamePhysics, Department of


Files in this item

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.