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Plasma deposition of Ultrathin polymer films on carbon nanotubes

dc.contributor.authorShi, Dongluen_US
dc.contributor.authorLian, Jieen_US
dc.contributor.authorHe, Pengen_US
dc.contributor.authorWang, L. M.en_US
dc.contributor.authorvan Ooij, Wim J.en_US
dc.contributor.authorSchulz, Mark J.en_US
dc.contributor.authorLiu, Yijunen_US
dc.contributor.authorMast, David B.en_US
dc.date.accessioned2010-05-06T23:09:57Z
dc.date.available2010-05-06T23:09:57Z
dc.date.issued2002-12-30en_US
dc.identifier.citationShi, Donglu; Lian, Jie; He, Peng; Wang, L. M.; van Ooij, Wim J.; Schulz, Mark; Liu, Yijun; Mast, David B. (2002). "Plasma deposition of Ultrathin polymer films on carbon nanotubes." Applied Physics Letters 81(27): 5216-5218. <http://hdl.handle.net/2027.42/71075>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/71075
dc.description.abstractUltrathin films of pyrrole were deposited on the surfaces of carbon nanotubes using a plasma polymerization treatment. High-resolution electron transmission microscopy images revealed that an extremely thin film of the polymer layer (2 ∼ 7 nm)(2∼7nm) was uniformly deposited on the outer and inner surfaces of the nanotubes. The nanotubes of all sizes exhibited equally uniform ultrathin films, indicating well-dispersed nanotubes in the fluidized bed reactor during the plasma treatment. In particular, the inner wall of the nanotube was also coated with a uniform ultrathin film of only ∼1–3 nm. Time-of-flight secondary ion mass spectroscopy experiments confirmed the highly branched and cross-linked polymer thin films on the carbon nanotubes. The plasma deposition mechanism is discussed in this letter. © 2002 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent300635 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titlePlasma deposition of Ultrathin polymer films on carbon nanotubesen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Nuclear Engineering and Radiological Science, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationumDepartment of Nuclear Engineering and Radiological Science, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of Cincinnati, Cincinnati, Ohio 45221en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of Cincinnati, Cincinnati, Ohio 45221en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of Cincinnati, Cincinnati, Ohio 45221en_US
dc.contributor.affiliationotherDepartment of Mechanical Engineering, University of Cincinnati, Cincinnati, Ohio 45221en_US
dc.contributor.affiliationotherDepartment of Physics, University of Cincinnati, Cincinnati, Ohio 45221en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/71075/2/APPLAB-81-27-5216-1.pdf
dc.identifier.doi10.1063/1.1527702en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.identifier.citedreferenceApplied Sciences, Inc., 141 W. Xena Ave., P.O. Box 579, Cedarville, OH 45314-0579.en_US
dc.owningcollnamePhysics, Department of


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