Analytical Formulation of Incremental Electrical Conductivity in Semiconductors arising from an Accumulation Space‐Charge Layer
dc.contributor.author | Lee, Vin‐jang | en_US |
dc.contributor.author | Mason, Donald R. | en_US |
dc.date.accessioned | 2010-05-06T23:12:08Z | |
dc.date.available | 2010-05-06T23:12:08Z | |
dc.date.issued | 1964-05 | en_US |
dc.identifier.citation | Lee, Vin‐Jang; Mason, Donald R. (1964). "Analytical Formulation of Incremental Electrical Conductivity in Semiconductors arising from an Accumulation Space‐Charge Layer." Journal of Applied Physics 35(5): 1557-1562. <http://hdl.handle.net/2027.42/71098> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/71098 | |
dc.description.abstract | Analytic expressions are derived which relate the incremental electrical conductivity in an accumulation layer on a semiconductor to the concentration of surface ions. The theory is checked both by comparing the predicted results with published graphs which were obtained by numerical integrations, and by evaluating three separate sets of experimental data on different semiconducting materials. The data of Weller and Voltz for the effect of oxygen adsorbed on Cr2O3 do not fit the assumptions of the theory, since their particles are too small. The data of Smith for oxygen adsorbed on CuO, and the data of Molinari et al. for hydrogen on ZnO indicate that the observed trends are all in the proper direction and of the proper magnitude to support this work, but they are not of sufficient precision to support these derivations conclusively. Although a definitive quantitative experimental check remains to be done, the reasonableness of the derivation has been established. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 499737 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Analytical Formulation of Incremental Electrical Conductivity in Semiconductors arising from an Accumulation Space‐Charge Layer | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Chemical and Metallurgical Engineering, The University of Michigan, Ann Arbor, Michigan | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/71098/2/JAPIAU-35-5-1557-1.pdf | |
dc.identifier.doi | 10.1063/1.1713666 | en_US |
dc.identifier.source | Journal of Applied Physics | en_US |
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dc.owningcollname | Physics, Department of |
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