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Subband gap carrier dynamics in low-temperature-grown GaAs

dc.contributor.authorGrenier, P.en_US
dc.contributor.authorWhitaker, John F.en_US
dc.date.accessioned2010-05-06T23:18:48Z
dc.date.available2010-05-06T23:18:48Z
dc.date.issued1997-04-14en_US
dc.identifier.citationGrenier, P.; Whitaker, J. F. (1997). "Subband gap carrier dynamics in low-temperature-grown GaAs." Applied Physics Letters 70(15): 1998-2000. <http://hdl.handle.net/2027.42/71168>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/71168
dc.description.abstractMeasurements of the carrier relaxation dynamics in low-temperature-grown GaAs have been made with a femtosecond-resolution, time-resolved pump-probe technique using a subband-gap probe-beam wavelength. The transient absorption and index of refraction changes have been analyzed using a relaxation model with up to four different excited state populations. The carrier recombination time within the midgap trap states is found to be longer than the subpicosecond free-carrier trapping time. Two time scales are observed for the recombination rate, one of a few picoseconds and one of hundreds of picoseconds, indicating the presence of at least two different trap states for the free-carriers in this material. © 1997 American Institute of Physics.  en_US
dc.format.extent3102 bytes
dc.format.extent86436 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleSubband gap carrier dynamics in low-temperature-grown GaAsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCenter for Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109-2099en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/71168/2/APPLAB-70-15-1998-1.pdf
dc.identifier.doi10.1063/1.118802en_US
dc.identifier.sourceApplied Physics Lettersen_US
dc.identifier.citedreferenceF. W. Smith, A. R. Calawa, C.-L. Chen, M. J. Manfra, and L. J. Mahoney, IEEE Electron Device Lett. EDLEDZINS9, 77 (1988).en_US
dc.identifier.citedreferenceD. C. Look, J. Appl. Phys. JAPIAUAIP70, 3148 (1991).en_US
dc.identifier.citedreferenceS. Gupta, J. F. Whitaker, and G. A. Mourou, IEEE J. Quantum Electron. IEJQA7INS28, 2464 (1992).en_US
dc.identifier.citedreferenceJ. F. Whitaker, Mater. Sci. Eng. B MSBTEKINS23, 61 (1993).en_US
dc.identifier.citedreferenceS. D. Benjamin, H. S. Loka, A. Othonos, and P. W. E. Smith, Appl. Phys. Lett. APPLABAIP68, 2544 (1996).en_US
dc.identifier.citedreferenceA. J. Lochtefeld, M. R. Melloch, J. C. P. Chang, and E. S. Harmon, Appl. Phys. Lett. APPLABAIP69, 1465 (1996).en_US
dc.identifier.citedreferenceY. Sung, H. H. Wang, T. B. Norris, and J. F. Whitaker, in Conference on Laser and Electro-optics, OSA Technical Digest Series (Optical Society of America, Washington, DC, 1996), Vol. 9, p. 454.en_US
dc.identifier.citedreferenceU. Siegner, R. Fluck, G. Zhang, and U. Keller, Appl. Phys. Lett. APPLABAIP69, 2566 (1996).en_US
dc.identifier.citedreferenceB. R. Bennett, R. A. Soref, and J. A. Del Alamo, IEEE J. Quantum Electron. IEJQA7INS26, 113 (1990).en_US
dc.identifier.citedreferenceH. T. Grahn, C. Thomsen, and J. Tauc, Opt. Commun. OPCOB8INS58, 226 (1986).en_US
dc.identifier.citedreferenceR. Tommasi, P. Langot, and F. Vallée, Appl. Phys. Lett. APPLABAIP66, 1361 (1995).en_US
dc.owningcollnamePhysics, Department of


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