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Study of hard x-ray emission from intense femtosecond TiTi:sapphire laser–solid target interactions

dc.contributor.authorChen, L. M.en_US
dc.contributor.authorForget, P.en_US
dc.contributor.authorFourmaux, S.en_US
dc.contributor.authorKieffer, Jean-Claudeen_US
dc.contributor.authorKrol, Andrzejen_US
dc.contributor.authorChamberlain, C. C.en_US
dc.contributor.authorHou, Bixueen_US
dc.contributor.authorNees, John A.en_US
dc.contributor.authorMourou, Gerard A.en_US
dc.date.accessioned2010-05-06T23:23:50Z
dc.date.available2010-05-06T23:23:50Z
dc.date.issued2004-09en_US
dc.identifier.citationChen, L. M.; Forget, P.; Fourmaux, S.; Kieffer, J. C.; Krol, A.; Chamberlain, C. C.; Hou, B. X.; Nees, J.; Mourou, G. (2004). "Study of hard x-ray emission from intense femtosecond TiTi:sapphire laser–solid target interactions." Physics of Plasmas 11(9): 4439-4445. <http://hdl.handle.net/2027.42/71221>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/71221
dc.description.abstractInteraction of intense TiTi:sapphire laser with solid targets has been studied experimentally by measuring hard x-ray and hot electron generation. Hard x-ray (8–100 keV)(8–100keV) emission spectrum and KαKα x-ray conversion efficiency (ηK)(ηK) from plasma have been studied as a function of laser intensity (1017–1019  W/cm2)(1017–1019W∕cm2), pulse duration (70–400)fs(70–400)fs, and laser pulse fluence. For intensity I>1×1017 W/cm2I>1×1017W∕cm2, the Ag ηKAgηK increases to reach a maximum value of 2×10−52×10−5 at an intensity I = 4×1018 W/cm2I=4×1018W∕cm2. Hot electron temperature (KTh)(KTh) and ηKηK scaling laws have been studied as a function of the laser parameters. A stronger dependence of KThKTh and ηKηK as a function of the laser fluence than on pulse duration or laser intensity has been observed. The contribution of another nonlinear mechanism, besides resonance absorption, to hard x-ray enhancement has been demonstrated via hot electron angular distribution and particle-in-cell simulations.en_US
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dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleStudy of hard x-ray emission from intense femtosecond TiTi:sapphire laser–solid target interactionsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCUOS, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherINRS-Energie, Matériaux et Télécommunications, Université du Québec, Varennes (Quebec) J3X 1S2, Canadaen_US
dc.contributor.affiliationotherUpstate Medical University, SUNY, Syracuse, New York 13210en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/71221/2/PHPAEN-11-9-4439-1.pdf
dc.identifier.doi10.1063/1.1781625en_US
dc.identifier.sourcePhysics of Plasmasen_US
dc.identifier.citedreferenceM. D. Perry and G. Mourou, ScienceSCIEAS 264, 917 (1994);D. Strickland and G. Mourou, Opt. Commun.OPCOB8 56, 219 (1985).en_US
dc.identifier.citedreferenceW.L. Kruer, The Physics of Laser Plasma Interactions (Addison-Wesley, New York, 1988);N. H. Burnett and G. D. Enright, Can. J. Chem.CJCHAG 64, 920 (1986).en_US
dc.identifier.citedreferenceF. Brunel, Phys. Rev. Lett.PRLTAO 59, 52 (1987);L. M. Chen, J. Zhang, Q. L. Dong, H. Teng, T. J. Liang, L. Z. Zhao, and Z. Y. Wei, Phys. PlasmasPHPAEN 8, 2925 (2001).en_US
dc.identifier.citedreferenceH. Chen, B. Soom, B. Yaakobi, S. Uchida, and D. D. Meyerhofer, Phys. Rev. Lett.PRLTAO 70, 3431 (1993);T. Feurer, W. Theobald, R. Sauerbrey et al., Phys. Rev. EPLEEE8 56, 4608 (1997).en_US
dc.identifier.citedreferenceJ. C. Kieffer, M. Chaker, J. P. Matte et al., Phys. Fluids BPFBPEI 5, 2676 (1993).en_US
dc.identifier.citedreferenceJ. C. Kieffer, A. Krol, Z. Jiang, C. Chamberlain, E. Scalzetti, and Z. Ichalalene, Appl. Phys. B: Lasers Opt.APBOEM 74, 75 (2002).en_US
dc.identifier.citedreferenceJ. Yu, Z. Jiang, J. C. Kieffer, and A. Krol, Phys. PlasmasPHPAEN 6, 1318 (1999).en_US
dc.identifier.citedreferenceB. Soom, H. Chen, Y. Fisher, and D. D. Meyerhofer, J. Appl. Phys.JAPIAU 74, 5372 (1993).en_US
dc.identifier.citedreferenceM. Schnürer, R. Nolte, A. Rousse, G. Grillon, G. Cheriaux, M. P. Kalachnikov, P. V. Nickles, and W. Sandner, Phys. Rev. EPLEEE8 61, 4394 (2000).en_US
dc.identifier.citedreferenceU. Teubner, J. Bergmann, B. van Wonterghem, F. P. Schäfer, and R. Sauerbrey, Phys. Rev. Lett.PRLTAO 70, 794 (1993);U. Teubner, I. Uschmann, P. Gibbon et al., Phys. Rev. EPLEEE8 54, 4167 (1996).en_US
dc.identifier.citedreferenceD. C. Eder, G. Pretzler, E. Fill, K. Eidmann, and A. Saemann, Appl. Phys. B: Lasers Opt.APBOEM 70, 211 (2000).en_US
dc.identifier.citedreferenceC. Reich, P. Gibbon, I. Uschmann, and E. Forster, Phys. Rev. Lett.PRLTAO 84, 4846 (2000).en_US
dc.identifier.citedreferenceA. Zhidkov, A. Sasaki, T. Utsumi et al., Phys. Rev. EPLEEE8 62, 7232 (2000).en_US
dc.identifier.citedreferenceL. M. Chen, P. Forget, R. Toth et al., Rev. Sci. Instrum.RSINAK 74, 5035 (2003).en_US
dc.identifier.citedreferenceK. Chu and A. Fenster, Med. Phys.MPHYA6 10, 772 (1983).en_US
dc.identifier.citedreferenceL. M. Chen, J. J. Park, K.-H. Hong, J. L. Kim, J. Zhang, and C. H. Nam, Phys. Rev. EPLEEE8 66, 025402 (2002);L. M. Chen, J. Zhang, H. Teng, Q. L. Dong, Z. L. Chen, T. J. Liang, L. Z. Zhao, and Z. Y. Wei, PLEEE8 63, 036403 (2001).en_US
dc.identifier.citedreferenceD. Salzmann, C. Reich, I. Uschmann, and E. Forster, Phys. Rev. EPLEEE8 65, 036402 (2002).en_US
dc.identifier.citedreferenceD. Altenbernd et al., J. Phys. BJPAPEH 30, 3969 (1997).en_US
dc.identifier.citedreferenceG. Pretzler, F. Brandl, J. Stein, E. Fill, and J. Kuba, Appl. Phys. Lett.APPLAB 82, 3623 (2003).en_US
dc.identifier.citedreferenceE. Esarey, P. Sprangle, J. Krall, and A. Ting, IEEE J. Quantum Electron.IEJQA7 33, 1879 (1997).en_US
dc.identifier.citedreferenceY. Sentoku, H. Ruhl, K. Mima, R. Kodama, K. A. Tanaka, and Y. Kishimoto, Phys. PlasmasPHPAEN 6, 2855 (1999).en_US
dc.identifier.citedreferenceL. M. Chen, J. Zhang, Y. T. Li et al., Phys. Rev. Lett.PRLTAO 87, 225001 (2001);D. F. Cai, Y. Q. Gu, Z. J. Zheng, T. S. Wen, S. T. Chunyu, Z. B. Wang, and X. D. Yang, Phys. PlasmasPHPAEN 10, 3265 (2003).en_US
dc.identifier.citedreferenceH. Schwoerer, P. Gibbon, S. Dusterer, R. Behrens, C. Ziener, C. Reith, and R. Sauerbrey, Phys. Rev. Lett.PRLTAO 86, 2317 (2001).en_US
dc.identifier.citedreferenceP. Gibbon and A. R. Bell, Phys. Rev. Lett.PRLTAO 68, 1535 (1992);PRLTAO 73, 664 (1994).en_US
dc.identifier.citedreferenceM. K. Grimes, A. R. Rundquist, Y. S. Lee, and M. C. Downer, Phys. Rev. Lett.PRLTAO 82, 4010 (1999).en_US
dc.identifier.citedreferenceJ. C. Adams, A. Heron, S. Guerin, G. Laval, P. Mora, and B. Quesnel, Phys. Rev. Lett.PRLTAO 78, 4765 (1997).en_US
dc.identifier.citedreferenceS. C. Wilks, W. L. Kruer, M. Tabak, and A. B. Langdon, Phys. Rev. Lett.PRLTAO 69, 1383 (1992).en_US
dc.identifier.citedreferenceZ. M. Sheng, Y. Sentoku, K. Mima, J. Zhang, W. Yu, and J. Meyer-ter-Vehn, Phys. Rev. Lett.PRLTAO 85, 5340 (2000).en_US
dc.identifier.citedreferenceV. A. Vshivkov, N. M. Naumova, F. Pegoraro, and S. V. Bulanov, Phys. PlasmasPHPAEN 5, 2727 (1998).en_US
dc.identifier.citedreferenceH. Teng, J. Zhang, Z. L. Chen, Y. T. Li, K. Li, X. Y. Peng, and J. X. Ma, Phys. Rev. EPLEEE8 67, 026408 (2003).en_US
dc.identifier.citedreferenceJ. R. Davies, A. R. Bell, and M. Tatarakis, Phys. Rev. EPLEEE8 59, 6032 (1999).en_US
dc.identifier.citedreferenceC. Ziener, I. Uschmann, G. Stobrawa et al., Phys. Rev. EPLEEE8 65, 066411 (2002).en_US
dc.identifier.citedreferenceR. Lichters, J. Meyer-ter-Vehn, and A. Pukhov, Phys. PlasmasPHPAEN 3, 3425 (1996).en_US
dc.identifier.citedreferenceJ. P. Freidberg, R. W. Mitchell, R. L. Morse, and L. I. Rudsinski, Phys. Rev. Lett.PRLTAO 28, 795 (1972).en_US
dc.owningcollnamePhysics, Department of


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