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Computer-aided simulation of a rotary sputtering magnetron
dc.contributor.authorFan, Qi Huaen_US
dc.contributor.authorGracio, J. J.en_US
dc.contributor.authorZhou, Li Qinen_US
dc.date.accessioned2010-05-06T23:30:13Z
dc.date.available2010-05-06T23:30:13Z
dc.date.issued2004-06-01en_US
dc.identifier.citationFan, Qi Hua; Gracio, J. J.; Zhou, Li Qin (2004). "Computer-aided simulation of a rotary sputtering magnetron." Journal of Applied Physics 95(11): 6017-6020. <http://hdl.handle.net/2027.42/71287>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/71287
dc.description.abstractIn the past, computer-aided simulation of sputtering magnetron has been applied mainly to planar cathodes with flat target surfaces. In this work, we have simulated the target erosion profile of a cylindrical rotary magnetron by tracing electron trajectories and predicting ionization distribution. The electric potential is prescribed as a radial function. A fourth-order Runge–Kutta method is used to solve the electron movement equations, and a Monte Carlo method is employed to predict electron/Ar collision. It is shown that the simulation can predict the target erosion with reasonable accuracy. © 2004 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent223696 bytes
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dc.format.mimetypeapplication/octet-stream
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleComputer-aided simulation of a rotary sputtering magnetronen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherDepartment of Mechanical Engineering, Center for Mechanical Technology and Automation, University of Aveiro, 3810 Aveiro, Portugalen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/71287/2/JAPIAU-95-11-6017-1.pdf
dc.identifier.doi10.1063/1.1715133en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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