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High-Throughput, Continuous Nanopatterning Technologies for Display and Energy Applications.

dc.contributor.authorAhn, Se Hyunen_US
dc.date.accessioned2010-06-03T15:53:35Z
dc.date.availableNO_RESTRICTIONen_US
dc.date.available2010-06-03T15:53:35Z
dc.date.issued2010en_US
dc.date.submitteden_US
dc.identifier.urihttps://hdl.handle.net/2027.42/76015
dc.description.abstractThe motivation of this work is to enable continuous patterning of nanostructures on flexible substrates to push nanoscale lithography to an entirely new level with drastically increased throughput. The Roll-to-Roll Nanoimprint Lithography (R2RNIL) technology presented in this work retains the high-resolution feature capabilities of traditional NIL, but with an increase in throughput by at least one or two orders of magnitude. We demonstrated large-area (4” wide) continuous imprinting of nanogratings by using a newly developed apparatus capable of roll-to-roll imprinting on flexible substrates (R2RNIL) and roll-to-plate imprinting on rigid substrates (R2PNIL). In addition, analytical models were developed to predict the residual layer thickness in dynamic R2RNIL. As a potential application, high-performance metal wire-grid polarizers have also been fabricated utilizing R2RNIL. Another research focus involved Direct Metal Imprinting (DMI) to create discrete nano-scale metal gratings. DMI uses a polymer cushion layer between a thin metal layer and a hard substrate, which enables room-temperature nanoimprinting of the metal by overcoming troublesome hard-to-hard surface contact issues while preserving the Si mold. We also introduced a novel nanofabrication technique, Dynamic Nano-Inscribing (DNI) for creating truly continuous nanograting patterns by using the sharp edge of a tilted Si mold on a variety of metals or polymer materials, creating linewidths down to 50 nm at extremely high speeds (~100 mm/sec) under ambient conditions. Additionally, a new nanograting fabrication method, Localized Dynamic Wrinkling (LDW) has been developed. LDW enables the continuous formation of micro/nano-scale gratings by simply sliding a flat edge of a cleaved Si wafer over the metal film. LDW shares the same basic principle as the buckling (wrinkling) phenomenon but the moving edge of the tilted Si wafer exerts stress on a metal coated polymer and sequentially generates localized winkles in the metal film in a dynamic fashion. The period in LDW can be controlled by several processing parameters and shows good agreement with a theoretical model. Finally, we developed a Dynamic Nano-Cutting (DNC) process using high-frequency indentations on a moving substrate to sequentially create nanograting patterns. DNC provides perfectly straight lines with real-time period modulation, which is difficult to achieve by other nanomanufacturing techniques.en_US
dc.format.extent7169624 bytes
dc.format.extent1373 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_USen_US
dc.subjectHigh-throughput Continuous Nanopatterning for Display and Energy Applicationsen_US
dc.titleHigh-Throughput, Continuous Nanopatterning Technologies for Display and Energy Applications.en_US
dc.typeThesisen_US
dc.description.thesisdegreenamePhDen_US
dc.description.thesisdegreedisciplineMechanical Engineeringen_US
dc.description.thesisdegreegrantorUniversity of Michigan, Horace H. Rackham School of Graduate Studiesen_US
dc.contributor.committeememberGuo, L. Jayen_US
dc.contributor.committeememberKurabayashi, Katsuoen_US
dc.contributor.committeememberKim, Jinsangen_US
dc.contributor.committeememberPipe, Kevin Patricken_US
dc.subject.hlbsecondlevelElectrical Engineeringen_US
dc.subject.hlbsecondlevelMechanical Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/76015/1/happyash_1.pdf
dc.owningcollnameDissertations and Theses (Ph.D. and Master's)


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