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Maskless Photolithography System

dc.contributor.authorHassan, Ahmad
dc.contributor.authorLangley, David
dc.contributor.authorLapprich, Kevin
dc.contributor.authorLudwig, Dustin
dc.contributor.advisorChronis, Nikos
dc.date.accessioned2011-09-12T00:03:53Z
dc.date.available2011-09-12T00:03:53Z
dc.date.issued2009-12
dc.identifier.urihttps://hdl.handle.net/2027.42/86196
dc.descriptionFinal report for Project 02 of ME450, Winter 2009 semester.en_US
dc.description.abstractPhotolithography is a key process in the semiconductor industry (e.g. in the integrated circuit and MEMS industry) that is based on the use of expensive optical equipment (steppers) to pattern micron-size features on silicon wafers. The goal of the project is to manufacture an inexpensive, photolithographic system for photo-patterning submicron-resolution features.en_US
dc.description.sponsorshipNikos Chronis (Mechanical Engineering, U of M)en_US
dc.language.isoen_USen_US
dc.subjectME450en_US
dc.subjectF09en_US
dc.subjectMasklessen_US
dc.subjectPhotolithographyen_US
dc.titleMaskless Photolithography Systemen_US
dc.typeProjecten_US
dc.subject.hlbsecondlevelMechanical Engineering
dc.subject.hlbtoplevelEngineering
dc.contributor.affiliationumStudentsen_US
dc.contributor.affiliationumcampusAnn Arbor
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/86196/1/ME450 Fall2009 Final Report - Project 02 - Maskless Photolithography System.pdf
dc.owningcollnameMechanical Engineering, Department of


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