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Interfacial Stoichiometry and Adhesion at Metal/α‐Al 2 O 3 Interfaces
dc.contributor.authorLi, Hong‐Taoen_US
dc.contributor.authorChen, Lian‐Fengen_US
dc.contributor.authorYuan, Xunen_US
dc.contributor.authorZhang, Wen‐Qingen_US
dc.contributor.authorSmith, John R.en_US
dc.contributor.authorEvans, Anthony G.en_US
dc.date.accessioned2011-11-10T15:37:55Z
dc.date.available2012-07-12T17:42:24Zen_US
dc.date.issued2011-06en_US
dc.identifier.citationLi, Hong‐tao ; Chen, Lian‐feng ; Yuan, Xun; Zhang, Wen‐qing ; Smith, John R.; Evans, Anthony G. (2011). "Interfacial Stoichiometry and Adhesion at Metal/αâ Al 2 O 3 Interfaces." Interfacial Stoichiometry and Adhesion at Metal/αâ Al 2 O 3 Interfaces 94: s154-s159. <http://hdl.handle.net/2027.42/87085>en_US
dc.identifier.issn0002-7820en_US
dc.identifier.issn1551-2916en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/87085
dc.publisherBlackwell Publishing Incen_US
dc.publisherWiley Periodicals, Inc.en_US
dc.titleInterfacial Stoichiometry and Adhesion at Metal/α‐Al 2 O 3 Interfacesen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherState Key Laboratory of High Performance Ceramics and Superfine Microstructures, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, Chinaen_US
dc.contributor.affiliationotherGraduate School of the Chinese Academy of Sciences, Beijing 200049, Chinaen_US
dc.contributor.affiliationotherEntry‐Exit Inspection & Quarantine Bureau, Shanghai 200135, Chinaen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/87085/1/jace4405.pdf
dc.identifier.doi10.1111/j.1551-2916.2011.04405.xen_US
dc.identifier.sourceInterfacial Stoichiometry and Adhesion at Metal/α‐Al 2 O 3 Interfacesen_US
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dc.owningcollnameInterdisciplinary and Peer-Reviewed


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