A hybrid analysis of ellipsometry data from patterned structures
dc.contributor.author | Kong, Wei | en_US |
dc.contributor.author | Huang, Hsu-ting | en_US |
dc.contributor.author | Terry,, Fred L. | en_US |
dc.date.accessioned | 2011-11-15T16:00:06Z | |
dc.date.available | 2011-11-15T16:00:06Z | |
dc.date.issued | 2001-01-29 | en_US |
dc.identifier.citation | Kong, Wei; Huang, Hsu-ting; Terry,, Fred L. (2001). "A hybrid analysis of ellipsometry data from patterned structures." AIP Conference Proceedings 550(1): 373-377. <http://hdl.handle.net/2027.42/87397> | en_US |
dc.identifier.other | APCPCS-550-1 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/87397 | |
dc.description.abstract | Rigorous coupled wave analysis (RCWA) has been used for modeling the polarization dependent reflection from periodic patterns for process monitoring and control. However, the computational load of this vector method is very heavy. In this paper, we will carefully examine a much simpler scalar method for reflection modeling. We also extend the application of the vector analysis to some special non-periodic structures by combining RCWA with the scalar model. We conclude that this hybrid approach is of significant promise for in situ IC production applications. © 2001 American Institute of Physics. | en_US |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | A hybrid analysis of ellipsometry data from patterned structures | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/87397/2/373_1.pdf | |
dc.identifier.doi | 10.1063/1.1354427 | en_US |
dc.identifier.source | CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2000 | en_US |
dc.owningcollname | Physics, Department of |
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