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A hybrid analysis of ellipsometry data from patterned structures

dc.contributor.authorKong, Weien_US
dc.contributor.authorHuang, Hsu-tingen_US
dc.contributor.authorTerry,, Fred L.en_US
dc.date.accessioned2011-11-15T16:00:06Z
dc.date.available2011-11-15T16:00:06Z
dc.date.issued2001-01-29en_US
dc.identifier.citationKong, Wei; Huang, Hsu-ting; Terry,, Fred L. (2001). "A hybrid analysis of ellipsometry data from patterned structures." AIP Conference Proceedings 550(1): 373-377. <http://hdl.handle.net/2027.42/87397>en_US
dc.identifier.otherAPCPCS-550-1en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/87397
dc.description.abstractRigorous coupled wave analysis (RCWA) has been used for modeling the polarization dependent reflection from periodic patterns for process monitoring and control. However, the computational load of this vector method is very heavy. In this paper, we will carefully examine a much simpler scalar method for reflection modeling. We also extend the application of the vector analysis to some special non-periodic structures by combining RCWA with the scalar model. We conclude that this hybrid approach is of significant promise for in situ IC production applications. © 2001 American Institute of Physics.en_US
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleA hybrid analysis of ellipsometry data from patterned structuresen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/87397/2/373_1.pdf
dc.identifier.doi10.1063/1.1354427en_US
dc.identifier.sourceCHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2000en_US
dc.owningcollnamePhysics, Department of


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