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Prediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transport
dc.contributor.authorWu, K. C.en_US
dc.contributor.authorSeefeldt, K. F.en_US
dc.contributor.authorSolomon, Michael J.en_US
dc.contributor.authorHalloran, John W.en_US
dc.date.accessioned2011-11-15T16:00:25Z
dc.date.available2011-11-15T16:00:25Z
dc.date.issued2005-07-15en_US
dc.identifier.citationWu, K. C.; Seefeldt, K. F.; Solomon, M. J.; Halloran, J. W. (2005). "Prediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transport." Journal of Applied Physics 98(2): 024902-024902-10. <http://hdl.handle.net/2027.42/87411>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/87411
dc.description.abstractA general, quantitative relationship between the photon-transport mean free path (l*)(l*) and resin sensitivity (DP)(DP) in multiple-scattering alumina/monomer suspensions formulated for ceramic stereolithography is presented and experimentally demonstrated. A Mie-theory-based computational method with structure factor contributions to determine l*l* was developed. Planar-source diffuse transmittance experiments were performed on monodisperse and bimodal polystyrene/water and alumina/monomer systems to validate this computational tool. The experimental data support the application of this l*l* calculation method to concentrated suspensions composed of nonaggregating particles of moderately aspherical shape and log-normal size distribution. The values of DPDP are shown to be approximately five times that of l*l* in the tested ceramic stereolithography suspensions.en_US
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titlePrediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transporten_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationumDepartment of Chemical Engineering, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/87411/2/024902_1.pdf
dc.identifier.doi10.1063/1.1980531en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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