Prediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transport
dc.contributor.author | Wu, K. C. | en_US |
dc.contributor.author | Seefeldt, K. F. | en_US |
dc.contributor.author | Solomon, Michael J. | en_US |
dc.contributor.author | Halloran, John W. | en_US |
dc.date.accessioned | 2011-11-15T16:00:25Z | |
dc.date.available | 2011-11-15T16:00:25Z | |
dc.date.issued | 2005-07-15 | en_US |
dc.identifier.citation | Wu, K. C.; Seefeldt, K. F.; Solomon, M. J.; Halloran, J. W. (2005). "Prediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transport." Journal of Applied Physics 98(2): 024902-024902-10. <http://hdl.handle.net/2027.42/87411> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/87411 | |
dc.description.abstract | A general, quantitative relationship between the photon-transport mean free path (l*)(l*) and resin sensitivity (DP)(DP) in multiple-scattering alumina/monomer suspensions formulated for ceramic stereolithography is presented and experimentally demonstrated. A Mie-theory-based computational method with structure factor contributions to determine l*l* was developed. Planar-source diffuse transmittance experiments were performed on monodisperse and bimodal polystyrene/water and alumina/monomer systems to validate this computational tool. The experimental data support the application of this l*l* calculation method to concentrated suspensions composed of nonaggregating particles of moderately aspherical shape and log-normal size distribution. The values of DPDP are shown to be approximately five times that of l*l* in the tested ceramic stereolithography suspensions. | en_US |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Prediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transport | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationum | Department of Chemical Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/87411/2/024902_1.pdf | |
dc.identifier.doi | 10.1063/1.1980531 | en_US |
dc.identifier.source | Journal of Applied Physics | en_US |
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