Suppression of current fluctuations in a crossed E×BE×B field system for low-voltage plasma immersion treatment
dc.contributor.author | Levchenko, Igor | en_US |
dc.contributor.author | Keidar, Michael | en_US |
dc.contributor.author | Ostrikov, Kostya | en_US |
dc.contributor.author | Yu, M. Y. | en_US |
dc.date.accessioned | 2011-11-15T16:01:37Z | |
dc.date.available | 2011-11-15T16:01:37Z | |
dc.date.issued | 2006-01-01 | en_US |
dc.identifier.citation | Levchenko, I.; Keidar, M.; Ostrikov, K.; Yu, M. Y. (2006). "Suppression of current fluctuations in a crossed E×BE×B field system for low-voltage plasma immersion treatment." Journal of Applied Physics 99(1): 013301-013301-6. <http://hdl.handle.net/2027.42/87466> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/87466 | |
dc.description.abstract | Plasma transport in a hybrid dc vacuum arc plasma source for ion deposition and plasma immersion treatment is considered. It is found that external crossed electric and magnetic fields near the substrate can significantly reduce the relative amplitude of ion current fluctuations fI¯f at the substrate surface. In particular, fI¯f decreases with the applied magnetic field when the bias voltage exceeds 300 V300V, thus allowing one to reduce the deviations from the rated process parameters. This phenomenon can be attributed to an interaction between the metal-plasma jet from the arc source and the discharge plasma in the crossed fields. | en_US |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Suppression of current fluctuations in a crossed E×BE×B field system for low-voltage plasma immersion treatment | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Aerospace Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationother | School of Physics, University of Sydney, Sydney NSW 2006, Australia | en_US |
dc.contributor.affiliationother | School of Physics, University of Sydney, Sydney NSW 2006, Australia | en_US |
dc.contributor.affiliationother | Institute for Theoretical Physics I, Ruhr University Bochum, Bochum 44780, Germany | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/87466/2/013301_1.pdf | |
dc.identifier.doi | 10.1063/1.2136416 | en_US |
dc.identifier.source | Journal of Applied Physics | en_US |
dc.identifier.citedreference | A. Anders, Surf. Coat. Technol. 93, 158 (1997). | en_US |
dc.identifier.citedreference | Handbook of Plasma Immersion Ion Implantation and Deposition, edited by A. Anders (Wiley, New York, 2000). | en_US |
dc.identifier.citedreference | J. M. Schneider, S. Rohde, W. D. Sproul, and A. Matthews, J. Phys. D 33, R173 (2000). | en_US |
dc.identifier.citedreference | J. Rosen, A. Anders, L. Hultman, and J. M. Schneider, J. Appl. Phys. 94, 1414 (2003). | en_US |
dc.identifier.citedreference | I. Levchenko, M. Romanov, O. Baranov, and M. Keidar, Vacuum 72, 335 (2003). | en_US |
dc.identifier.citedreference | K. Ostrikov, Rev. Mod. Phys. 77, 489 (2005). | en_US |
dc.identifier.citedreference | I. G. Brown, X. Godechot, and K. M. Yu, Appl. Phys. Lett. 58, 1392 (1991). | en_US |
dc.identifier.citedreference | S. Mukherjee, J. Chakraborty, S. Gupta, P. M. Raole, P. I. John, K. R. M. Rao, and I. Manna, Surf. Coat. Technol. 156, 103 (2002). | en_US |
dc.identifier.citedreference | R. Günzel, M. Betzl, I. Alphonsa, B. Ganguly, P. I. John, and S. Mukherjee, Surf. Coat. Technol. 112, 307 (1999). | en_US |
dc.identifier.citedreference | M. Ueda, L. A. Berni, R. M. Castro, A. F. Beloto, E. Abramof, J. O. Rossi, J. J. Barroso, and C. M. Lepienski, Surf. Coat. Technol. 156, 71 (2002). | en_US |
dc.identifier.citedreference | D. M. Sanders and A. Anders, Surf. Coat. Technol. 133–134, 78 (2000). | en_US |
dc.identifier.citedreference | B. Juttner, J. Phys. D 34, R103 (2001). | en_US |
dc.identifier.citedreference | B. Juttner and I. Kleberg, J. Phys. D 33, 2025 (2000). | en_US |
dc.identifier.citedreference | V. N. Zhitomirsky, R. L. Boxman, and S. J. Goldsmith, J. Vac. Sci. Technol. A 13, 2233 (1995). | en_US |
dc.identifier.citedreference | I. I. Beilis, M. Keidar, R. L. Boxman, and S. Goldsmith, J. Appl. Phys. 83, 709 (1998). | en_US |
dc.identifier.citedreference | I. Levchenko, M. Romanov, and M. Korobov, Surf. Coat. Technol. 184∕2–3, 356 (2004). | en_US |
dc.identifier.citedreference | I. Levchenko, M. Romanov, and M. Keidar, J. Appl. Phys. 94, 1408 (2003). | en_US |
dc.identifier.citedreference | M. Keidar, O. R. Monteiro, and I. G. Brown, Appl. Phys. Lett. 76, 3002 (2000). | en_US |
dc.identifier.citedreference | I. G. Brown, O. R. Monteiro, M. M. M. Bilek, M. Keidar, E. Oks, and A. Vizir, Rev. Sci. Instrum. 71, 1086 (2000). | en_US |
dc.identifier.citedreference | M. Keidar, O. R. Monteiro, A. Anders, and I. D. Boyd, Appl. Phys. Lett. 81, 1183 (2002). | en_US |
dc.identifier.citedreference | I. Levchenko, A. Voloshko, M. Keidar, and I. I. Beilis, IEEE Trans. Plasma Sci. 31, 137 (2003). | en_US |
dc.identifier.citedreference | A. Anders, S. Anders, and I. G. Brown, Plasma Sources Sci. Technol. 4, 01 (1995). | en_US |
dc.identifier.citedreference | B. Juttner, J. Phys. D 28, 516 (1995). | en_US |
dc.owningcollname | Physics, Department of |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.