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Ultrahigh intensity laser for laser wakefield acceleration

dc.contributor.authorMourou, Gerard A.en_US
dc.contributor.authorNees, John A.en_US
dc.contributor.authorBiswal, Subraten_US
dc.date.accessioned2011-11-15T16:03:46Z
dc.date.available2011-11-15T16:03:46Z
dc.date.issued1997-03-05en_US
dc.identifier.citationMourou, Gerard; Nees, John; Biswal, Subrat (1997). "Ultrahigh intensity laser for laser wakefield acceleration." AIP Conference Proceedings 398(1): 68-75. <http://hdl.handle.net/2027.42/87564>en_US
dc.identifier.otherAPCPCS-398-1en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/87564
dc.description.abstractThe next generation of high peak power CPA laser systems will be improved in compactness, simplicity, and cost. Yb:glass is a suitable choice for the amplifier medium in such a laser system necessary for an all-optical GeV accelerator. © 1997 American Institute of Physics.en_US
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleUltrahigh intensity laser for laser wakefield accelerationen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCenter for Ultrafast Optical Science, University of Michigan, 2200 Bonisteel Blvd, IST 1006, Ann Arbor, Michigan 48109-2099en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/87564/2/68_1.pdf
dc.identifier.doi10.1063/1.53040en_US
dc.identifier.sourceThe seventh workshop on advanced accelerator conceptsen_US
dc.owningcollnamePhysics, Department of


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