Electron injection by dephasing electrons with laser fields
dc.contributor.author | Dodd, E. | en_US |
dc.contributor.author | Kim, J. K. | en_US |
dc.contributor.author | Umstadter, Donald P. | en_US |
dc.date.accessioned | 2011-11-15T16:07:12Z | |
dc.date.available | 2011-11-15T16:07:12Z | |
dc.date.issued | 1999-07-12 | en_US |
dc.identifier.citation | Dodd, E.; Kim, J. K.; Umstadter, D. (1999). "Electron injection by dephasing electrons with laser fields." AIP Conference Proceedings 472(1): 886-890. <http://hdl.handle.net/2027.42/87718> | en_US |
dc.identifier.other | APCPCS-472-1 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/87718 | |
dc.description.abstract | The authors seek to review injection concepts for plasma based acceleration. It is shown that regardless of injection mechanism, resultant beams will be similar due to wave structure. Also, most schemes employ the same basic processes, namely the dephasing of electrons by laser fields, and can thus be analyzed with similar approaches. © 1999 American Institute of Physics. | en_US |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Electron injection by dephasing electrons with laser fields | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Center for Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/87718/2/886_1.pdf | |
dc.identifier.doi | 10.1063/1.58935 | en_US |
dc.identifier.source | The eighth workshop on advanced accelerator concepts | en_US |
dc.owningcollname | Physics, Department of |
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