Electron injection by dephasing electrons with laser fields

Dodd, E.; Kim, J. K.; Umstadter, Donald P.

Electron injection by dephasing electrons with laser fields

dc.contributor.author	Dodd, E.	en_US
dc.contributor.author	Kim, J. K.	en_US
dc.contributor.author	Umstadter, Donald P.	en_US
dc.date.accessioned	2011-11-15T16:07:12Z
dc.date.available	2011-11-15T16:07:12Z
dc.date.issued	1999-07-12	en_US
dc.identifier.citation	Dodd, E.; Kim, J. K.; Umstadter, D. (1999). "Electron injection by dephasing electrons with laser fields." AIP Conference Proceedings 472(1): 886-890. <http://hdl.handle.net/2027.42/87718>	en_US
dc.identifier.other	APCPCS-472-1	en_US
dc.identifier.uri	https://hdl.handle.net/2027.42/87718
dc.description.abstract	The authors seek to review injection concepts for plasma based acceleration. It is shown that regardless of injection mechanism, resultant beams will be similar due to wave structure. Also, most schemes employ the same basic processes, namely the dephasing of electrons by laser fields, and can thus be analyzed with similar approaches. © 1999 American Institute of Physics.	en_US
dc.publisher	The American Institute of Physics	en_US
dc.rights	© The American Institute of Physics	en_US
dc.title	Electron injection by dephasing electrons with laser fields	en_US
dc.type	Article	en_US
dc.subject.hlbsecondlevel	Physics	en_US
dc.subject.hlbtoplevel	Science	en_US
dc.description.peerreviewed	Peer Reviewed	en_US
dc.contributor.affiliationum	Center for Ultrafast Optical Science, University of Michigan, Ann Arbor, Michigan 48109	en_US
dc.description.bitstreamurl	http://deepblue.lib.umich.edu/bitstream/2027.42/87718/2/886_1.pdf
dc.identifier.doi	10.1063/1.58935	en_US
dc.identifier.source	The eighth workshop on advanced accelerator concepts	en_US
dc.owningcollname	Physics, Department of

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