Pulsed laser ignition of reactive multilayer films
dc.contributor.author | Picard, Yoosuf N. | en_US |
dc.contributor.author | Adams, David P. | en_US |
dc.contributor.author | Palmer, Jeremy A. | en_US |
dc.contributor.author | Yalisove, Steven M. | en_US |
dc.date.accessioned | 2011-11-15T16:08:19Z | |
dc.date.available | 2011-11-15T16:08:19Z | |
dc.date.issued | 2006-04-03 | en_US |
dc.identifier.citation | Picard, Yoosuf N.; Adams, David P.; Palmer, Jeremy A.; Yalisove, Steven M. (2006). "Pulsed laser ignition of reactive multilayer films." Applied Physics Letters 88(14): 144102-144102-3. <http://hdl.handle.net/2027.42/87770> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/87770 | |
dc.description.abstract | Nanostructured Al/PtAl∕Pt multilayer films were ignited by single pulse irradiation from a Ti:sapphire femtosecond laser system. Critical ignition fluences (0.9–22 J/cm2)(0.9–22J∕cm2) required to initiate a self-propagating reaction were quantified for different multilayer designs. Multilayers with smaller bilayer thickness required relatively lower fluence for ignition. Ignition threshold fluence was also found to be 1.4–3.6 times higher for Al-capped multilayers than for Pt-capped multilayers. Ablation threshold fluences were measured for Al (860±70 mJ/cm2)(860±70mJ∕cm2) and Pt (540±50 mJ/cm2)(540±50mJ∕cm2) and related to the observed difference in ignition fluences for Al- and Pt-capped multilayers. | en_US |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Pulsed laser ignition of reactive multilayer films | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, University of Michigan, 2300 Hayward Street, Ann Arbor, Michigan 48109-2136 | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, University of Michigan, 2300 Hayward Street, Ann Arbor, Michigan 48109-2136 | en_US |
dc.contributor.affiliationother | Sandia National Laboratories, P.O. Box 5800, Albuquerque, New Mexico 87185 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/87770/2/144102_1.pdf | |
dc.identifier.doi | 10.1063/1.2191952 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
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