Show simple item record

Synthesis and ferroelectric properties of epitaxial BiFeO3BiFeO3 thin films grown by sputtering

dc.contributor.authorDas, R. R.en_US
dc.contributor.authorKim, D. M.en_US
dc.contributor.authorBaek, Seung-Hyuben_US
dc.contributor.authorEom, Chang-Beomen_US
dc.contributor.authorZavaliche, F.en_US
dc.contributor.authorYang, S. Y.en_US
dc.contributor.authorRamesh, Ramamoorthyen_US
dc.contributor.authorChen, Y. B.en_US
dc.contributor.authorPan, Xiaoqingen_US
dc.contributor.authorKe, X.en_US
dc.contributor.authorRzchowski, M. S.en_US
dc.contributor.authorStreiffer, S. K.en_US
dc.date.accessioned2011-11-15T16:08:25Z
dc.date.available2011-11-15T16:08:25Z
dc.date.issued2006-06-12en_US
dc.identifier.citationDas, R. R.; Kim, D. M.; Baek, S. H.; Eom, C. B.; Zavaliche, F.; Yang, S. Y.; Ramesh, R.; Chen, Y. B.; Pan, X. Q.; Ke, X.; Rzchowski, M. S.; Streiffer, S. K. (2006). "Synthesis and ferroelectric properties of epitaxial BiFeO3BiFeO3 thin films grown by sputtering." Applied Physics Letters 88(24): 242904-242904-3. <http://hdl.handle.net/2027.42/87775>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/87775
dc.description.abstractWe have grown epitaxial BiFeO3BiFeO3 thin films with smooth surfaces on (001), (101), and (111) SrTiO3SrTiO3 substrates using sputtering. Four-circle x-ray diffraction and cross-sectional transmission electron microscopy show that the BiFeO3BiFeO3 thin films have rhombohedral symmetry although small monoclinic distortions have not been ruled out. Stripe ferroelectric domains oriented perpendicular to the substrate miscut direction and free of impurity phase are observed in BiFeO3BiFeO3 on high miscut (4°) (001) SrTiO3SrTiO3, which attributes to a relatively high value of remanent polarization ( ∼ 71 μC/cm2)(∼71μC∕cm2). Films grown on low miscut (0.8°) SrTiO3SrTiO3 have a small amount of impure phase α-Fe2O3α-Fe2O3 which contributes to lower the polarization values ( ∼ 63 μC/cm2)(∼63μC∕cm2). The BiFeO3BiFeO3 films grown on (101) and (111) SrTiO3SrTiO3 exhibited remanent polarizations of 86 and 98 μC/cm298μC∕cm2, respectively.en_US
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleSynthesis and ferroelectric properties of epitaxial BiFeO3BiFeO3 thin films grown by sputteringen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of Wisconsin–Madison, Madison, Wisconsin 53706en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of California, Berkeley, California 94720en_US
dc.contributor.affiliationotherDepartment of Physics, University of Wisconsin–Madison, Madison, Wisconsin 53706en_US
dc.contributor.affiliationotherMaterials Science Division, Argonne National Laboratory, Argonne, Illinois 60439en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/87775/2/242904_1.pdf
dc.identifier.doi10.1063/1.2213347en_US
dc.identifier.sourceApplied Physics Lettersen_US
dc.identifier.citedreferenceG. A. Smolenskii and I. E. Chupis, Usp. Fiz. Nauk 137, 415 (1982); Sov. Phys. Usp. 25, 475 (1982).en_US
dc.identifier.citedreferenceN. A. Hill, J. Phys. Chem. B 104, 6694 (2000).en_US
dc.identifier.citedreferenceJ. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 299, 1719 (2003).en_US
dc.identifier.citedreferenceJ. Li, J. Wang, M. Wuttig, R. Ramesh, N. Wang, B. Ruette, A. P. Pyatakov, A. K. Zvezdin, and D. Viehland, Appl. Phys. Lett. 84, 5261 (2004).en_US
dc.identifier.citedreferenceC. Ederer and N. A. Spaldin, Phys. Rev. B 71, 224103 (2005).en_US
dc.identifier.citedreferenceJ. R. Teague, R. Gerson, and W. J. James, Solid State Commun. 8, 1073 (1970).en_US
dc.identifier.citedreferenceY. P. Wang, L. Zhou, M. F. Zhang, X. Y. Chen, J. M. Liu, and Z. G. Liu, Appl. Phys. Lett. 84, 1731 (2004).en_US
dc.identifier.citedreferenceJ. Wang, A. Scholl, H. Zheng, S. B. Ogale, D. Viehland, D. G. Schlom, N. A. Spaldin, K. M. Rabe, M. Wuttig, L. Mohaddes, J. Neaton, U. V. Waghmare, T. Zhao, and R. Ramesh, Science 307, 1203b (2005).en_US
dc.identifier.citedreferenceX. Qi, M. Wei, Y. Lin, Q. Jia, D. Zhi, J. Dho, M. G. Blamire, and J. L. M. Manus-Driscoll, Appl. Phys. Lett. 86, 071913 (2005).en_US
dc.identifier.citedreferenceG. Xu, H. Hiraka, G. Shirane, J. Li, J. Wang, and D. Viehland, Appl. Phys. Lett. 86, 182905 (2005).en_US
dc.identifier.citedreferenceK. Y. Yun, M. Noda, M. Okuyama, H. Saeki, H. Tabata, and K. Saito, J. Appl. Phys. 96, 3399 (2004).en_US
dc.identifier.citedreferenceD. M. Kim, R. R. Das, S. H. Baek, and C. B. Eom (unpublished).en_US
dc.identifier.citedreferenceC. B. Eom, A. F. Marshall, S. S. Laderman, R. D. Jacowitz, and T. H. Geballe, Science 249, 1549 (1990).en_US
dc.identifier.citedreferenceC. B. Eom, R. J. Cava, R. M. Fleming, J. M. Phillips, R. B. Vandover, J. H. Marshall, J. W. P. Hsu, J. J. Krajewski, and W. F. Peck, Science 258, 1766 (1992).en_US
dc.identifier.citedreferenceR. A. Rao, Q. Gan, and C. B. Eom, Appl. Phys. Lett. 71, 1171 (1997).en_US
dc.identifier.citedreferenceS. D. Bu, M. K. Lee, C. B. Eom, W. Tian, X. Q. Pan, S. K. Streiffer, and J. J. Krajewski, Appl. Phys. Lett. 79, 3482 (2001).en_US
dc.identifier.citedreferenceD. M. Kim, S. H. Baek, R. R. Das, and C. B. Eom (unpublished).en_US
dc.identifier.citedreferenceF. Zavaliche, S. Y. Yang, P. Shafer, R. Ramesh, R. R. Das, D. M. Kim, and C. B. Eom, Appl. Phys. Lett. 87, 182912 (2005).en_US
dc.identifier.citedreferenceF. Kubel and H. Schmid, Acta Crystallogr., Sect. B: Struct. Sci. B46, 698 (1990).en_US
dc.owningcollnamePhysics, Department of


Files in this item

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.