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Revealing hidden pore structure in nanoporous thin films using positronium annihilation lifetime spectroscopy

dc.contributor.authorPeng, Huagenen_US
dc.contributor.authorFrieze, William E.en_US
dc.contributor.authorVallery, Richard S.en_US
dc.contributor.authorGidley, David W.en_US
dc.contributor.authorMoore, Darren L.en_US
dc.contributor.authorCarter, Richard J.en_US
dc.date.accessioned2011-11-15T16:09:50Z
dc.date.available2011-11-15T16:09:50Z
dc.date.issued2005-03-21en_US
dc.identifier.citationPeng, Hua-Gen; Frieze, William E.; Vallery, Richard S.; Gidley, David W.; Moore, Darren L.; Carter, Richard J. (2005). "Revealing hidden pore structure in nanoporous thin films using positronium annihilation lifetime spectroscopy." Applied Physics Letters 86(12): 121904-121904-3. <http://hdl.handle.net/2027.42/87843>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/87843
dc.description.abstractThe highly inhomogeneous pore morphology of a plasma-enhanced-chemical-vapor-deposited ultralow-kk dielectric film (k = 2.2)(k=2.2) has been revealed using depth-profiled positronium annihilation lifetime spectroscopy (PALS) combined with progressive etch back of the film surface. The film is found to have a dense surface layer, an intermediate layer of 1.8 nm1.8nm diameter mesopores, and a deep region of ∼ 3 nm∼3nm diameter mesopores. After successively etching of the sealing layer and the isolated 1.8 nm1.8nm pore region, PALS reveals that the underlying large pores are highly interconnected. This inhomogeneous pore structure is proposed to account for observed difficulties in film integration.en_US
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleRevealing hidden pore structure in nanoporous thin films using positronium annihilation lifetime spectroscopyen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Physics, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherLSI Logic Corporation, 23400 NE Glisan Street, Gresham, Oregon 97030en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/87843/2/121904_1.pdf
dc.identifier.doi10.1063/1.1886905en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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