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Plasma deposition of thin carbonfluorine films on aligned carbon nanotube
dc.contributor.authorHe, Pengen_US
dc.contributor.authorShi, Dongluen_US
dc.contributor.authorLian, Jieen_US
dc.contributor.authorWang, L. M.en_US
dc.contributor.authorEwing, Rodney C.en_US
dc.contributor.authorvan Ooij, Wim J.en_US
dc.contributor.authorLi, W. Z.en_US
dc.contributor.authorRen, Z. F.en_US
dc.date.accessioned2011-11-15T16:09:58Z
dc.date.available2011-11-15T16:09:58Z
dc.date.issued2005-01-24en_US
dc.identifier.citationHe, Peng; Shi, Donglu; Lian, Jie; Wang, L. M.; Ewing, Rodney C.; van Ooij, Wim; Li, W. Z.; Ren, Z. F. (2005). "Plasma deposition of thin carbonfluorine films on aligned carbon nanotube." Applied Physics Letters 86(4): 043107-043107-3. <http://hdl.handle.net/2027.42/87850>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/87850
dc.description.abstractThe thin film of carbonfluorine was deposited on the surfaces of aligned carbon nanotubes using a plasma polymerization treatment. High-resolution transmission electron microscopy images revealed that a thin film of the polymer layer (20 nm)(20nm) was uniformly deposited on the surfaces of the aligned carbon nanotubes. Time-of-flight secondary ion mass spectroscopy and Fourier transform infrared experiments identified the carbonfluorine thin films on the carbon nanotubes. The plasma deposition mechanism is discussed.en_US
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titlePlasma deposition of thin carbonfluorine films on aligned carbon nanotubeen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartments of Geological Sciences and Material Science & Engineering, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherDepartment of Mechanical Engineering, University of Cincinnati, Cincinnati, Ohio 45221en_US
dc.contributor.affiliationotherDepartment of Chemical and Materials Engineering, University of Cincinnati, Cincinnati, Ohio 45221en_US
dc.contributor.affiliationotherDepartment of Chemical and Materials Engineering, University of Cincinnati, Cincinnati, Ohio 45221en_US
dc.contributor.affiliationotherDepartment of Physics, Florida International University, Miami, Florida 33199en_US
dc.contributor.affiliationotherDepartment of Physics, Boston College, Boston, Massachusetts 02467en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/87850/2/043107_1.pdf
dc.identifier.doi10.1063/1.1846957en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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