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A New Class of Room‐Temperature Multiferroic Thin Films with Bismuth‐Based Supercell Structure

dc.contributor.authorChen, Aipingen_US
dc.contributor.authorZhou, Honghuien_US
dc.contributor.authorBi, Zhenxingen_US
dc.contributor.authorZhu, Yuanyuanen_US
dc.contributor.authorLuo, Zhipingen_US
dc.contributor.authorBayraktaroglu, Adrianen_US
dc.contributor.authorPhillips, Jamieen_US
dc.contributor.authorChoi, Eun‐mien_US
dc.contributor.authorMacmanus‐driscoll, Judith L.en_US
dc.contributor.authorPennycook, Stephen J.en_US
dc.contributor.authorNarayan, Jagdishen_US
dc.contributor.authorJia, Quanxien_US
dc.contributor.authorZhang, Xinghangen_US
dc.contributor.authorWang, Haiyanen_US
dc.date.accessioned2013-03-05T18:17:46Z
dc.date.available2014-04-02T15:08:07Zen_US
dc.date.issued2013-02-20en_US
dc.identifier.citationChen, Aiping; Zhou, Honghui; Bi, Zhenxing; Zhu, Yuanyuan; Luo, Zhiping; Bayraktaroglu, Adrian; Phillips, Jamie; Choi, Eun‐mi ; Macmanus‐driscoll, Judith L. ; Pennycook, Stephen J.; Narayan, Jagdish; Jia, Quanxi; Zhang, Xinghang; Wang, Haiyan (2013). "A New Class of Roomâ Temperature Multiferroic Thin Films with Bismuthâ Based Supercell Structure." Advanced Materials 25(7): 1028-1032. <http://hdl.handle.net/2027.42/96720>en_US
dc.identifier.issn0935-9648en_US
dc.identifier.issn1521-4095en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/96720
dc.publisherWILEY‐VCH Verlagen_US
dc.subject.otherThin Filmsen_US
dc.subject.otherMultiferroicsen_US
dc.subject.otherStrain Engineeringen_US
dc.subject.otherFerrimagnetic Materialsen_US
dc.subject.otherFerroelectric Materialsen_US
dc.titleA New Class of Room‐Temperature Multiferroic Thin Films with Bismuth‐Based Supercell Structureen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelEngineering (General)en_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationotherMaterials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USAen_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, NSF Center for Advanced Materials and Smart Structures, North Carolina State University, Raleigh, NC 27695, USAen_US
dc.contributor.affiliationotherDepartment of Electrical and Computer Engineering, Texas A&M University, College Station, TX 77843‐3128, USA.en_US
dc.contributor.affiliationotherDepartment of Mechanical Engineering, Texas A&M University, College Station, TX 77843, USAen_US
dc.contributor.affiliationotherCenter for Integrated Nanotechnologies (CINT), Los Alamos National Laboratory, Los Alamos, NM 87545, USAen_US
dc.contributor.affiliationotherDepartment of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ, UKen_US
dc.contributor.affiliationotherDepartment of Chemistry and Physics, Fayetteville State University, Fayetteville, NC 28301, USA and Microscopy and Imaging Center, Texas A&M University, College Station, TX 77843, USAen_US
dc.contributor.affiliationotherDepartment of Electrical and Computer Engineering, Texas A&M University, College Station, TX 77843‐3128, USAen_US
dc.identifier.pmid23180693en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/96720/1/1028_ftp.pdf
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/96720/2/adma_201203051_sm_suppl.pdf
dc.identifier.doi10.1002/adma.201203051en_US
dc.identifier.sourceAdvanced Materialsen_US
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dc.owningcollnameInterdisciplinary and Peer-Reviewed


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