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Temperature-programmed desorption of H2 from molybdenum nitride thin films

dc.contributor.authorChoi, Jeong-Gilen_US
dc.contributor.authorLee, Hyuek Joonen_US
dc.contributor.authorThompson, Levi T.en_US
dc.date.accessioned2006-04-10T18:02:39Z
dc.date.available2006-04-10T18:02:39Z
dc.date.issued1994-07en_US
dc.identifier.citationChoi, Jeong-Gil, Lee, Hyuek Joon, Thompson, Levi T. (1994/07)."Temperature-programmed desorption of H2 from molybdenum nitride thin films." Applied Surface Science 78(3): 299-307. <http://hdl.handle.net/2027.42/31475>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6THY-46BW8JD-4D/2/5b54480b1a294c790bf8e28d9ff3cfc9en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/31475
dc.description.abstractThe thermal desorption of hydrogen from [beta]-Mo16N7, [gamma]-Mo2N and [delta]-MoN thin films was investigated. Hydrogen adsorption at [approximate]270 K produced two hydrogen desorption peaks, one at [approximate]370 K (designated as the [beta]1 site) and the other at [approximate]800 K (designated as the [beta]2 site). We concluded that the [beta]1 peak was due to a low-energy surface site and the [beta]2 peak to a subsurface site. Desorption from the [beta]1 state obeyed first-order kinetics. The hydrogen saturation capacity increased in the following order: [beta]-Mo16N72N. This variation in saturation coverage tracked with the nominal molybdenum atom surface density. Nitrogen also desorbed from the Mo nitride surfaces during the H2 temperature-programmed desorption experiments producing a low-temperature peak at [approximate]370 K and several high-temperature peaks in the range 500-900 K. The amount of nitrogen that desorbed increased with increasing H2 dose, suggesting a hydrogen-induced nitrogen desorption process. Hydrogen may have weakened the Mo-N bond thereby facilitating the desorption of nitrogen. We believe that the low-temperature peak was due to nitrogen bound to Mo atoms at the surface. The high-temperature peaks were probably a consequence of hydrogen that diffused into the surface altering the Mo-N bonding in the subsurface region. Thermal desorption characteristics of the Mo nitride films were similar to those of a series of bulk [gamma]-Mo2N powders that we previously investigated. Apparent energies for hydrogen desorption from the low-temperature sites were near 25 kcal/mol, and both the thin films and powders possessed high-temperature subsurface binding sites. The most striking observation was the similarity between the characters of the [delta]-MoN film and the Mo nitride powder with the highest hydrodenitrogenation activity. This similarity suggested that the high activity was due to the presence of [delta]-MoN-like structures at or near the bulk powder surface.en_US
dc.format.extent831153 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleTemperature-programmed desorption of H2 from molybdenum nitride thin filmsen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemical Engineering, The University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationumDepartment of Chemical Engineering, The University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationumDepartment of Chemical Engineering, The University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/31475/1/0000397.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0169-4332(94)90018-3en_US
dc.identifier.sourceApplied Surface Scienceen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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