Temperature-programmed desorption of H2 from molybdenum nitride thin films
dc.contributor.author | Choi, Jeong-Gil | en_US |
dc.contributor.author | Lee, Hyuek Joon | en_US |
dc.contributor.author | Thompson, Levi T. | en_US |
dc.date.accessioned | 2006-04-10T18:02:39Z | |
dc.date.available | 2006-04-10T18:02:39Z | |
dc.date.issued | 1994-07 | en_US |
dc.identifier.citation | Choi, Jeong-Gil, Lee, Hyuek Joon, Thompson, Levi T. (1994/07)."Temperature-programmed desorption of H2 from molybdenum nitride thin films." Applied Surface Science 78(3): 299-307. <http://hdl.handle.net/2027.42/31475> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6THY-46BW8JD-4D/2/5b54480b1a294c790bf8e28d9ff3cfc9 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/31475 | |
dc.description.abstract | The thermal desorption of hydrogen from [beta]-Mo16N7, [gamma]-Mo2N and [delta]-MoN thin films was investigated. Hydrogen adsorption at [approximate]270 K produced two hydrogen desorption peaks, one at [approximate]370 K (designated as the [beta]1 site) and the other at [approximate]800 K (designated as the [beta]2 site). We concluded that the [beta]1 peak was due to a low-energy surface site and the [beta]2 peak to a subsurface site. Desorption from the [beta]1 state obeyed first-order kinetics. The hydrogen saturation capacity increased in the following order: [beta]-Mo16N72N. This variation in saturation coverage tracked with the nominal molybdenum atom surface density. Nitrogen also desorbed from the Mo nitride surfaces during the H2 temperature-programmed desorption experiments producing a low-temperature peak at [approximate]370 K and several high-temperature peaks in the range 500-900 K. The amount of nitrogen that desorbed increased with increasing H2 dose, suggesting a hydrogen-induced nitrogen desorption process. Hydrogen may have weakened the Mo-N bond thereby facilitating the desorption of nitrogen. We believe that the low-temperature peak was due to nitrogen bound to Mo atoms at the surface. The high-temperature peaks were probably a consequence of hydrogen that diffused into the surface altering the Mo-N bonding in the subsurface region. Thermal desorption characteristics of the Mo nitride films were similar to those of a series of bulk [gamma]-Mo2N powders that we previously investigated. Apparent energies for hydrogen desorption from the low-temperature sites were near 25 kcal/mol, and both the thin films and powders possessed high-temperature subsurface binding sites. The most striking observation was the similarity between the characters of the [delta]-MoN film and the Mo nitride powder with the highest hydrodenitrogenation activity. This similarity suggested that the high activity was due to the presence of [delta]-MoN-like structures at or near the bulk powder surface. | en_US |
dc.format.extent | 831153 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | Temperature-programmed desorption of H2 from molybdenum nitride thin films | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Chemical Engineering, The University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationum | Department of Chemical Engineering, The University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationum | Department of Chemical Engineering, The University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/31475/1/0000397.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/0169-4332(94)90018-3 | en_US |
dc.identifier.source | Applied Surface Science | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.