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Analysis of TiN by charged particle beams: Nuclear reaction analysis, nuclear reaction broadening and Rutherford backscattering

dc.contributor.authorRotberg, V. H. (Victor H.)en_US
dc.contributor.authorPerry, A. J.en_US
dc.contributor.authorStrandberg, C. C.en_US
dc.contributor.authorWas, Gary S.en_US
dc.date.accessioned2006-04-07T20:06:50Z
dc.date.available2006-04-07T20:06:50Z
dc.date.issued1988-12-01en_US
dc.identifier.citationRotberg, V. H., Perry, A. J., Strandberg, C. C., Was, G. (1988/12/01)."Analysis of TiN by charged particle beams: Nuclear reaction analysis, nuclear reaction broadening and Rutherford backscattering." Thin Solid Films 166(): 191-200. <http://hdl.handle.net/2027.42/27028>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6TW0-46X42J3-T/2/2596fe5c6c6b11b6bac3b77882a29923en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/27028
dc.description.abstractCharged particle beams have been used to extract data both on the composition and also on the thickness of two series of TiNx films (about 5 and 2 [mu]m thick respectively), where x varied from 0.3 to 1.0. The technique used were nuclear reaction analysis (NRA), resonance nuclear reaction broadening (NRB) and Rutherford backscattering, together with Auger electron spectroscopy (AES). The data from the NRB depth profiles scale remarkably well with the results from AES. The NRA results have the greatest experimental uncertainty and also indicate a systematic error which is not understood. Both NRA and NRB can return reliable film thickness data. It is also demonstrated that TiC should not be used as a reference standard when analyzing TiN films by AES.en_US
dc.format.extent512711 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleAnalysis of TiN by charged particle beams: Nuclear reaction analysis, nuclear reaction broadening and Rutherford backscatteringen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumMichigan Ion Beam Laboratory, Nuclear Engineering Department, University of Michigan, Ann Arbor, MI 48109, U.S.A.en_US
dc.contributor.affiliationumMichigan Ion Beam Laboratory, Nuclear Engineering Department, University of Michigan, Ann Arbor, MI 48109, U.S.A.en_US
dc.contributor.affiliationotherGTE Valenite Corporation, 1711 Thunderbird, Troy, MI 48084, U.S.A.en_US
dc.contributor.affiliationotherGTE Valenite Corporation, 1711 Thunderbird, Troy, MI 48084, U.S.A.en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/27028/1/0000016.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0040-6090(88)90380-Xen_US
dc.identifier.sourceThin Solid Filmsen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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