Analysis of TiN by charged particle beams: Nuclear reaction analysis, nuclear reaction broadening and Rutherford backscattering
dc.contributor.author | Rotberg, V. H. (Victor H.) | en_US |
dc.contributor.author | Perry, A. J. | en_US |
dc.contributor.author | Strandberg, C. C. | en_US |
dc.contributor.author | Was, Gary S. | en_US |
dc.date.accessioned | 2006-04-07T20:06:50Z | |
dc.date.available | 2006-04-07T20:06:50Z | |
dc.date.issued | 1988-12-01 | en_US |
dc.identifier.citation | Rotberg, V. H., Perry, A. J., Strandberg, C. C., Was, G. (1988/12/01)."Analysis of TiN by charged particle beams: Nuclear reaction analysis, nuclear reaction broadening and Rutherford backscattering." Thin Solid Films 166(): 191-200. <http://hdl.handle.net/2027.42/27028> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6TW0-46X42J3-T/2/2596fe5c6c6b11b6bac3b77882a29923 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/27028 | |
dc.description.abstract | Charged particle beams have been used to extract data both on the composition and also on the thickness of two series of TiNx films (about 5 and 2 [mu]m thick respectively), where x varied from 0.3 to 1.0. The technique used were nuclear reaction analysis (NRA), resonance nuclear reaction broadening (NRB) and Rutherford backscattering, together with Auger electron spectroscopy (AES). The data from the NRB depth profiles scale remarkably well with the results from AES. The NRA results have the greatest experimental uncertainty and also indicate a systematic error which is not understood. Both NRA and NRB can return reliable film thickness data. It is also demonstrated that TiC should not be used as a reference standard when analyzing TiN films by AES. | en_US |
dc.format.extent | 512711 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | Analysis of TiN by charged particle beams: Nuclear reaction analysis, nuclear reaction broadening and Rutherford backscattering | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Michigan Ion Beam Laboratory, Nuclear Engineering Department, University of Michigan, Ann Arbor, MI 48109, U.S.A. | en_US |
dc.contributor.affiliationum | Michigan Ion Beam Laboratory, Nuclear Engineering Department, University of Michigan, Ann Arbor, MI 48109, U.S.A. | en_US |
dc.contributor.affiliationother | GTE Valenite Corporation, 1711 Thunderbird, Troy, MI 48084, U.S.A. | en_US |
dc.contributor.affiliationother | GTE Valenite Corporation, 1711 Thunderbird, Troy, MI 48084, U.S.A. | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/27028/1/0000016.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/0040-6090(88)90380-X | en_US |
dc.identifier.source | Thin Solid Films | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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