On the model of Teflon ablation in an ablation-controlled discharge
dc.contributor.author | Keidar, Michael | en_US |
dc.contributor.author | Boyd, Iain D. | en_US |
dc.contributor.author | Beilis, Isak I. | en_US |
dc.date.accessioned | 2006-12-19T18:58:28Z | |
dc.date.available | 2006-12-19T18:58:28Z | |
dc.date.issued | 2001-06-07 | en_US |
dc.identifier.citation | Keidar, Michael; Boyd, Iain D; Beilis, Isak I (2001). "On the model of Teflon ablation in an ablation-controlled discharge." Journal of Physics D: Applied Physics. 34(11): 1675-1677. <http://hdl.handle.net/2027.42/48908> | en_US |
dc.identifier.issn | 0022-3727 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/48908 | |
dc.description.abstract | A kinetic model is developed of Teflon ablation caused by a plasma. The model takes into account the returned atom flux that forms in the non-equilibrium layer during the ablation. This approach makes it possible to calculate the ablation rate for the case when the Teflon surface temperature and the density and temperature in the plasma bulk are known. | en_US |
dc.format.extent | 3118 bytes | |
dc.format.extent | 107284 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.language.iso | en_US | |
dc.publisher | IOP Publishing Ltd | en_US |
dc.title | On the model of Teflon ablation in an ablation-controlled discharge | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Aerospace Engineering University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationum | Department of Aerospace Engineering University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationother | Electrical Discharge and Plasma Laboratory, Fleischman Faculty of Engineering, Tel Aviv University, POB 39040, Tel Aviv 69978, Israel | en_US |
dc.contributor.affiliationumcampus | Ann Arbor | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/48908/2/d11118.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1088/0022-3727/34/11/318 | en_US |
dc.identifier.source | Journal of Physics D: Applied Physics. | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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