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On the model of Teflon ablation in an ablation-controlled discharge
dc.contributor.authorKeidar, Michaelen_US
dc.contributor.authorBoyd, Iain D.en_US
dc.contributor.authorBeilis, Isak I.en_US
dc.date.accessioned2006-12-19T18:58:28Z
dc.date.available2006-12-19T18:58:28Z
dc.date.issued2001-06-07en_US
dc.identifier.citationKeidar, Michael; Boyd, Iain D; Beilis, Isak I (2001). "On the model of Teflon ablation in an ablation-controlled discharge." Journal of Physics D: Applied Physics. 34(11): 1675-1677. <http://hdl.handle.net/2027.42/48908>en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/48908
dc.description.abstractA kinetic model is developed of Teflon ablation caused by a plasma. The model takes into account the returned atom flux that forms in the non-equilibrium layer during the ablation. This approach makes it possible to calculate the ablation rate for the case when the Teflon surface temperature and the density and temperature in the plasma bulk are known.en_US
dc.format.extent3118 bytes
dc.format.extent107284 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleOn the model of Teflon ablation in an ablation-controlled dischargeen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Aerospace Engineering University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationumDepartment of Aerospace Engineering University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationotherElectrical Discharge and Plasma Laboratory, Fleischman Faculty of Engineering, Tel Aviv University, POB 39040, Tel Aviv 69978, Israelen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/48908/2/d11118.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0022-3727/34/11/318en_US
dc.identifier.sourceJournal of Physics D: Applied Physics.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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