TOPICAL REVIEW: Recent progress in nanoimprint technology and its applications
Guo, L. Jay
2004-06-07
Citation
Guo, L Jay (2004). "TOPICAL REVIEW: Recent progress in nanoimprint technology and its applications." Journal of Physics D: Applied Physics. 37(11): R123-R141. <http://hdl.handle.net/2027.42/48920>
Abstract
Nanoimprint is an emerging lithographic technology that promises high-throughput patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques. This article reviews the basic principles of nanoimprint technology and some of the recent progress in this field. It also explores a few alternative approaches that are related to nanoimprint as well as additive approaches for patterning polymer structures. Nanoimprint technology can not only create resist patterns as in lithography but can also imprint functional device structures in polymers. This property is exploited in several non-traditional microelectronic applications in the areas of photonics and biotechnology.Publisher
IOP Publishing Ltd
ISSN
0022-3727
Types
Article
Metadata
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