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Interface structure of YBa2Cu3Ox thin films prepared by a non-fluorine sol–gel route on a single-domain substrate

dc.contributor.authorShi, Dongluen_US
dc.contributor.authorXu, Yonglien_US
dc.contributor.authorLian, J.en_US
dc.contributor.authorWang, Luminen_US
dc.contributor.authorMcClellan, Shaun M.en_US
dc.date.accessioned2006-12-19T19:05:17Z
dc.date.available2006-12-19T19:05:17Z
dc.date.issued2002-05-01en_US
dc.identifier.citationShi, Donglu; Xu, Yongli; Lian, J; Wang, Lumin; McClellan, Shaun (2002). "Interface structure of YBa2Cu3Ox thin films prepared by a non-fluorine sol–gel route on a single-domain substrate." Superconductor Science and Technology. 15(5): 660-664. <http://hdl.handle.net/2027.42/48990>en_US
dc.identifier.issn0953-2048en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/48990
dc.description.abstractIn our previous work, we have shown that a single-domain YBa2Cu3Ox (YBCO) exhibits a low surface resistance. However, the second phase Y2BaCuO5 (211) precipitates inevitably as a result of peritectic reaction. These 211 particles are potential sources of RF losses, which need to be eliminated. In this study, a non-fluorine sol–gel synthesis was developed to deposit a YBCO thin film on the surface of single-domain YBCO. The deposited YBCO thin film entirely covered the 211 particles. The interface structure was studied by high-resolution transmission electron microscopy. The experimental results on sol–gel synthesis and thin film characterization are reported. Also discussed is the underlying mechanism of film growth on single-domain YBCO.en_US
dc.format.extent3118 bytes
dc.format.extent1058971 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleInterface structure of YBa2Cu3Ox thin films prepared by a non-fluorine sol–gel route on a single-domain substrateen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Nuclear Engineering and Radiological Science, University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationumDepartment of Nuclear Engineering and Radiological Science, University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of Cincinnati, Cincinnati, OH 45221-0012, USAen_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of Cincinnati, Cincinnati, OH 45221-0012, USAen_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of Cincinnati, Cincinnati, OH 45221-0012, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/48990/2/u20504.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0953-2048/15/5/304en_US
dc.identifier.sourceSuperconductor Science and Technology.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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