Successive ionic layer deposition: possibilities for gas sensor applications
dc.contributor.author | Korotcenkov, G. | en_US |
dc.contributor.author | Tolstoy, V. | en_US |
dc.contributor.author | Schwank, Johannes W. | en_US |
dc.contributor.author | Boris, I. | en_US |
dc.date.accessioned | 2006-12-19T19:06:16Z | |
dc.date.available | 2006-12-19T19:06:16Z | |
dc.date.issued | 2005-01-01 | en_US |
dc.identifier.citation | Korotcenkov, G; Tolstoy, V; Schwank, J; Boris, I (2005). "Successive ionic layer deposition: possibilities for gas sensor applications." Journal of Physics: Conference Series. 15(1): 45-50. <http://hdl.handle.net/2027.42/49002> | en_US |
dc.identifier.issn | 1742-6596 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/49002 | |
dc.description.abstract | In this paper we discuss results of research related to design of successive ionic layer deposition (SILD) technology for both preparing porous nano-structured SnO2 films, and surface modification of SnO2 films deposited by spray pyrolysis. This new method of metal oxide deposition has exited high interest, because of this method simplicity, cheapness, and ability to deposit thin nano-structured films on rough surfaces. Method of successive ionic layer deposition (SILD) consists essentially of repeated successive treatments of the conductive or dielectric substrates by solutions of various salts, which form on the substrate surface poorly soluble compounds. It was shown that SILD technology is effective method for above mentioned purposes. | en_US |
dc.format.extent | 3118 bytes | |
dc.format.extent | 328939 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.language.iso | en_US | |
dc.publisher | IOP Publishing Ltd | en_US |
dc.title | Successive ionic layer deposition: possibilities for gas sensor applications | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Dept. of Chemical Engineering, University of Michigan, Ann Arbor, USA | en_US |
dc.contributor.affiliationother | Laboratory of Micro- and Optoelectronics, Technical University of Moldova, Bld. Stefan cel Mare, 168, Chisinau, Moldova; | en_US |
dc.contributor.affiliationother | Dept. of Chemistry, St. Petersburg State University, St.Petersburg, Russia | en_US |
dc.contributor.affiliationother | Laboratory of Micro- and Optoelectronics, Technical University of Moldova, Bld. Stefan cel Mare, 168, Chisinau, Moldova | en_US |
dc.contributor.affiliationumcampus | Ann Arbor | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/49002/2/jpconf5_15_008.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1088/1742-6596/15/1/008 | en_US |
dc.identifier.source | Journal of Physics: Conference Series. | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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