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Successive ionic layer deposition: possibilities for gas sensor applications

dc.contributor.authorKorotcenkov, G.en_US
dc.contributor.authorTolstoy, V.en_US
dc.contributor.authorSchwank, Johannes W.en_US
dc.contributor.authorBoris, I.en_US
dc.date.accessioned2006-12-19T19:06:16Z
dc.date.available2006-12-19T19:06:16Z
dc.date.issued2005-01-01en_US
dc.identifier.citationKorotcenkov, G; Tolstoy, V; Schwank, J; Boris, I (2005). "Successive ionic layer deposition: possibilities for gas sensor applications." Journal of Physics: Conference Series. 15(1): 45-50. <http://hdl.handle.net/2027.42/49002>en_US
dc.identifier.issn1742-6596en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/49002
dc.description.abstractIn this paper we discuss results of research related to design of successive ionic layer deposition (SILD) technology for both preparing porous nano-structured SnO2 films, and surface modification of SnO2 films deposited by spray pyrolysis. This new method of metal oxide deposition has exited high interest, because of this method simplicity, cheapness, and ability to deposit thin nano-structured films on rough surfaces. Method of successive ionic layer deposition (SILD) consists essentially of repeated successive treatments of the conductive or dielectric substrates by solutions of various salts, which form on the substrate surface poorly soluble compounds. It was shown that SILD technology is effective method for above mentioned purposes.en_US
dc.format.extent3118 bytes
dc.format.extent328939 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleSuccessive ionic layer deposition: possibilities for gas sensor applicationsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDept. of Chemical Engineering, University of Michigan, Ann Arbor, USAen_US
dc.contributor.affiliationotherLaboratory of Micro- and Optoelectronics, Technical University of Moldova, Bld. Stefan cel Mare, 168, Chisinau, Moldova;en_US
dc.contributor.affiliationotherDept. of Chemistry, St. Petersburg State University, St.Petersburg, Russiaen_US
dc.contributor.affiliationotherLaboratory of Micro- and Optoelectronics, Technical University of Moldova, Bld. Stefan cel Mare, 168, Chisinau, Moldovaen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/49002/2/jpconf5_15_008.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/1742-6596/15/1/008en_US
dc.identifier.sourceJournal of Physics: Conference Series.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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