Silica dissolution as a route to octaanionic silsesquioxanes
Kang, K. H.; Laine, Richard M.
2006-06
Citation
Kang, K. H.; Laine, R. M. (2006). "Silica dissolution as a route to octaanionic silsesquioxanes." Applied Organometallic Chemistry 20(6): 393-398. <http://hdl.handle.net/2027.42/55232>
Abstract
The octaanion, [OSiO 1.5 ] 8 8− (OA) is a low cost, discrete nano silica particle that can be made directly from high surface area, amorphous silica reacted with Me 4 NOH in water alcohol mixtures. It would be ideal if Me 4 NOH could be formed in situ from, for example, Me 4 NCl and NaOH, as long known in the literature. This process would reduce costs and enable recycling of Me 4 NCl produced in the functionalization of OA with chlorosilanes, RMe 2 SiCl, to form [RMe 2 SiOSiO 1.5 ] 8 organic/inorganic hybrid nanobuilding blocks. Kinetic studies were conducted to assess base-promoted dissolution of fumed silica (25 m 2 /g) as a function of concentrations, times, etc., to form the octaanion [OSiO 1.5 ] 8 8− using Me 4 NOH, NaOH and mixtures of NaOH/Me 4 NCl. Surprisingly, we find that small amounts of Me 4 NCl greatly inhibit the dissolution reaction for reasons that are as yet unknown. Copyright © 2005 John Wiley & Sons, Ltd.Publisher
John Wiley & Sons, Ltd.
ISSN
0268-2605 1099-0739
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