Silica dissolution as a route to octaanionic silsesquioxanes

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dc.contributor.author Kang, K. H. en_US
dc.contributor.author Laine, R. M. en_US
dc.date.accessioned 2007-07-11T18:15:33Z
dc.date.available 2007-07-11T18:15:33Z
dc.date.issued 2006-06 en_US
dc.identifier.citation Kang, K. H.; Laine, R. M. (2006). "Silica dissolution as a route to octaanionic silsesquioxanes." Applied Organometallic Chemistry 20(6): 393-398. <http://hdl.handle.net/2027.42/55232> en_US
dc.identifier.issn 0268-2605 en_US
dc.identifier.issn 1099-0739 en_US
dc.identifier.uri http://hdl.handle.net/2027.42/55232
dc.description.abstract The octaanion, [OSiO 1.5 ] 8 8− (OA) is a low cost, discrete nano silica particle that can be made directly from high surface area, amorphous silica reacted with Me 4 NOH in water alcohol mixtures. It would be ideal if Me 4 NOH could be formed in situ from, for example, Me 4 NCl and NaOH, as long known in the literature. This process would reduce costs and enable recycling of Me 4 NCl produced in the functionalization of OA with chlorosilanes, RMe 2 SiCl, to form [RMe 2 SiOSiO 1.5 ] 8 organic/inorganic hybrid nanobuilding blocks. Kinetic studies were conducted to assess base-promoted dissolution of fumed silica (25 m 2 /g) as a function of concentrations, times, etc., to form the octaanion [OSiO 1.5 ] 8 8− using Me 4 NOH, NaOH and mixtures of NaOH/Me 4 NCl. Surprisingly, we find that small amounts of Me 4 NCl greatly inhibit the dissolution reaction for reasons that are as yet unknown. Copyright © 2005 John Wiley & Sons, Ltd. en_US
dc.format.extent 141234 bytes
dc.format.extent 3118 bytes
dc.format.mimetype application/pdf
dc.format.mimetype text/plain
dc.publisher John Wiley & Sons, Ltd. en_US
dc.subject.other Chemistry en_US
dc.subject.other Industrial Chemistry and Chemical Engineering en_US
dc.title Silica dissolution as a route to octaanionic silsesquioxanes en_US
dc.rights.robots IndexNoFollow en_US
dc.subject.hlbsecondlevel Biological Chemistry en_US
dc.subject.hlbsecondlevel Chemical Engineering en_US
dc.subject.hlbsecondlevel Chemistry en_US
dc.subject.hlbsecondlevel Materials Science and Engineering en_US
dc.subject.hlbtoplevel Health Sciences en_US
dc.subject.hlbtoplevel Science en_US
dc.subject.hlbtoplevel Engineering en_US
dc.description.peerreviewed Peer Reviewed en_US
dc.contributor.affiliationum Department of Materials Science and Engineering, and the Macromolecular Science and Engineering Program, University of Michigan, Ann Arbor, MI 48109-2136, USA ; On leave from Korean Chemicals Company en_US
dc.contributor.affiliationum Department of Materials Science and Engineering, and the Macromolecular Science and Engineering Program, University of Michigan, Ann Arbor, MI 48109-2136, USA ; This paper is dedicated to Professor Ulrich Schubert on the occasion of his 60th birthday ; University of Michigan, Ann Arbour, MI 48109-2136. en_US
dc.description.bitstreamurl http://deepblue.lib.umich.edu/bitstream/2027.42/55232/1/1071_ftp.pdf en_US
dc.identifier.doi http://dx.doi.org/10.1002/aoc.1071 en_US
dc.identifier.source Applied Organometallic Chemistry en_US
dc.owningcollname Interdisciplinary and Peer-Reviewed
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