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Silica dissolution as a route to octaanionic silsesquioxanes

dc.contributor.authorKang, K. H.en_US
dc.contributor.authorLaine, Richard M.en_US
dc.date.accessioned2007-07-11T18:15:33Z
dc.date.available2007-07-11T18:15:33Z
dc.date.issued2006-06en_US
dc.identifier.citationKang, K. H.; Laine, R. M. (2006). "Silica dissolution as a route to octaanionic silsesquioxanes." Applied Organometallic Chemistry 20(6): 393-398. <http://hdl.handle.net/2027.42/55232>en_US
dc.identifier.issn0268-2605en_US
dc.identifier.issn1099-0739en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/55232
dc.description.abstractThe octaanion, [OSiO 1.5 ] 8 8− (OA) is a low cost, discrete nano silica particle that can be made directly from high surface area, amorphous silica reacted with Me 4 NOH in water alcohol mixtures. It would be ideal if Me 4 NOH could be formed in situ from, for example, Me 4 NCl and NaOH, as long known in the literature. This process would reduce costs and enable recycling of Me 4 NCl produced in the functionalization of OA with chlorosilanes, RMe 2 SiCl, to form [RMe 2 SiOSiO 1.5 ] 8 organic/inorganic hybrid nanobuilding blocks. Kinetic studies were conducted to assess base-promoted dissolution of fumed silica (25 m 2 /g) as a function of concentrations, times, etc., to form the octaanion [OSiO 1.5 ] 8 8− using Me 4 NOH, NaOH and mixtures of NaOH/Me 4 NCl. Surprisingly, we find that small amounts of Me 4 NCl greatly inhibit the dissolution reaction for reasons that are as yet unknown. Copyright © 2005 John Wiley & Sons, Ltd.en_US
dc.format.extent141234 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.publisherJohn Wiley & Sons, Ltd.en_US
dc.subject.otherChemistryen_US
dc.subject.otherIndustrial Chemistry and Chemical Engineeringen_US
dc.titleSilica dissolution as a route to octaanionic silsesquioxanesen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelBiological Chemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelHealth Sciencesen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, and the Macromolecular Science and Engineering Program, University of Michigan, Ann Arbor, MI 48109-2136, USA ; On leave from Korean Chemicals Companyen_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, and the Macromolecular Science and Engineering Program, University of Michigan, Ann Arbor, MI 48109-2136, USA ; This paper is dedicated to Professor Ulrich Schubert on the occasion of his 60th birthday ; University of Michigan, Ann Arbour, MI 48109-2136.en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/55232/1/1071_ftp.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1002/aoc.1071en_US
dc.identifier.sourceApplied Organometallic Chemistryen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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