Silica dissolution as a route to octaanionic silsesquioxanes
dc.contributor.author | Kang, K. H. | en_US |
dc.contributor.author | Laine, Richard M. | en_US |
dc.date.accessioned | 2007-07-11T18:15:33Z | |
dc.date.available | 2007-07-11T18:15:33Z | |
dc.date.issued | 2006-06 | en_US |
dc.identifier.citation | Kang, K. H.; Laine, R. M. (2006). "Silica dissolution as a route to octaanionic silsesquioxanes." Applied Organometallic Chemistry 20(6): 393-398. <http://hdl.handle.net/2027.42/55232> | en_US |
dc.identifier.issn | 0268-2605 | en_US |
dc.identifier.issn | 1099-0739 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/55232 | |
dc.description.abstract | The octaanion, [OSiO 1.5 ] 8 8− (OA) is a low cost, discrete nano silica particle that can be made directly from high surface area, amorphous silica reacted with Me 4 NOH in water alcohol mixtures. It would be ideal if Me 4 NOH could be formed in situ from, for example, Me 4 NCl and NaOH, as long known in the literature. This process would reduce costs and enable recycling of Me 4 NCl produced in the functionalization of OA with chlorosilanes, RMe 2 SiCl, to form [RMe 2 SiOSiO 1.5 ] 8 organic/inorganic hybrid nanobuilding blocks. Kinetic studies were conducted to assess base-promoted dissolution of fumed silica (25 m 2 /g) as a function of concentrations, times, etc., to form the octaanion [OSiO 1.5 ] 8 8− using Me 4 NOH, NaOH and mixtures of NaOH/Me 4 NCl. Surprisingly, we find that small amounts of Me 4 NCl greatly inhibit the dissolution reaction for reasons that are as yet unknown. Copyright © 2005 John Wiley & Sons, Ltd. | en_US |
dc.format.extent | 141234 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.publisher | John Wiley & Sons, Ltd. | en_US |
dc.subject.other | Chemistry | en_US |
dc.subject.other | Industrial Chemistry and Chemical Engineering | en_US |
dc.title | Silica dissolution as a route to octaanionic silsesquioxanes | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Biological Chemistry | en_US |
dc.subject.hlbsecondlevel | Chemical Engineering | en_US |
dc.subject.hlbsecondlevel | Chemistry | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbtoplevel | Health Sciences | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, and the Macromolecular Science and Engineering Program, University of Michigan, Ann Arbor, MI 48109-2136, USA ; On leave from Korean Chemicals Company | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, and the Macromolecular Science and Engineering Program, University of Michigan, Ann Arbor, MI 48109-2136, USA ; This paper is dedicated to Professor Ulrich Schubert on the occasion of his 60th birthday ; University of Michigan, Ann Arbour, MI 48109-2136. | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/55232/1/1071_ftp.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1002/aoc.1071 | en_US |
dc.identifier.source | Applied Organometallic Chemistry | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.