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Domain Engineering for Enhanced Ferroelectric Properties of Epitaxial (001) BiFeO Thin Films

dc.contributor.authorJang, Ho Wonen_US
dc.contributor.authorOrtiz, Danielen_US
dc.contributor.authorBaek, Seung-Hyuben_US
dc.contributor.authorFolkman, Chad M.en_US
dc.contributor.authorDas, Rasmi R.en_US
dc.contributor.authorShafer, Padraicen_US
dc.contributor.authorChen, Yanbinen_US
dc.contributor.authorNelson, Christofer T.en_US
dc.contributor.authorPan, Xiaoqingen_US
dc.contributor.authorRamesh, Ramamoorthyen_US
dc.contributor.authorEom, Chang-Beomen_US
dc.date.accessioned2009-03-03T20:08:41Z
dc.date.available2010-04-14T17:40:05Zen_US
dc.date.issued2009-02-16en_US
dc.identifier.citationJang, Ho Won; Ortiz, Daniel; Baek, Seung-Hyub; Folkman, Chad M.; Das, Rasmi R.; Shafer, Padraic; Chen, Yanbin; Nelson, Christofer T.; Pan, Xiaoqing; Ramesh, Ramamoorthy; Eom, Chang-Beom (2009). "Domain Engineering for Enhanced Ferroelectric Properties of Epitaxial (001) BiFeO Thin Films." Advanced Materials 21(7): 817-823. <http://hdl.handle.net/2027.42/61869>en_US
dc.identifier.issn0935-9648en_US
dc.identifier.issn1521-4095en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/61869
dc.description.abstractNo Abstract.en_US
dc.format.extent962562 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.publisherWILEY-VCH Verlagen_US
dc.subject.otherChemistryen_US
dc.subject.otherPolymer and Materials Scienceen_US
dc.titleDomain Engineering for Enhanced Ferroelectric Properties of Epitaxial (001) BiFeO Thin Filmsen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelEngineering (General)en_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering University of Michigan Ann Arbor, MI 48109 (USA)en_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering University of Michigan Ann Arbor, MI 48109 (USA)en_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering University of Michigan Ann Arbor, MI 48109 (USA)en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA)en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA)en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA)en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA)en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA)en_US
dc.contributor.affiliationotherDepartment of Physics and Department of Materials Science and Engineering University of California Berkeley, CA 94720 (USA)en_US
dc.contributor.affiliationotherDepartment of Physics and Department of Materials Science and Engineering University of California Berkeley, CA 94720 (USA)en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA) ; Department of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA).en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/61869/1/817_ftp.pdf
dc.identifier.doi10.1002/adma.200800823en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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