Domain Engineering for Enhanced Ferroelectric Properties of Epitaxial (001) BiFeO Thin Films
dc.contributor.author | Jang, Ho Won | en_US |
dc.contributor.author | Ortiz, Daniel | en_US |
dc.contributor.author | Baek, Seung-Hyub | en_US |
dc.contributor.author | Folkman, Chad M. | en_US |
dc.contributor.author | Das, Rasmi R. | en_US |
dc.contributor.author | Shafer, Padraic | en_US |
dc.contributor.author | Chen, Yanbin | en_US |
dc.contributor.author | Nelson, Christofer T. | en_US |
dc.contributor.author | Pan, Xiaoqing | en_US |
dc.contributor.author | Ramesh, Ramamoorthy | en_US |
dc.contributor.author | Eom, Chang-Beom | en_US |
dc.date.accessioned | 2009-03-03T20:08:41Z | |
dc.date.available | 2010-04-14T17:40:05Z | en_US |
dc.date.issued | 2009-02-16 | en_US |
dc.identifier.citation | Jang, Ho Won; Ortiz, Daniel; Baek, Seung-Hyub; Folkman, Chad M.; Das, Rasmi R.; Shafer, Padraic; Chen, Yanbin; Nelson, Christofer T.; Pan, Xiaoqing; Ramesh, Ramamoorthy; Eom, Chang-Beom (2009). "Domain Engineering for Enhanced Ferroelectric Properties of Epitaxial (001) BiFeO Thin Films." Advanced Materials 21(7): 817-823. <http://hdl.handle.net/2027.42/61869> | en_US |
dc.identifier.issn | 0935-9648 | en_US |
dc.identifier.issn | 1521-4095 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/61869 | |
dc.description.abstract | No Abstract. | en_US |
dc.format.extent | 962562 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.publisher | WILEY-VCH Verlag | en_US |
dc.subject.other | Chemistry | en_US |
dc.subject.other | Polymer and Materials Science | en_US |
dc.title | Domain Engineering for Enhanced Ferroelectric Properties of Epitaxial (001) BiFeO Thin Films | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Engineering (General) | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering University of Michigan Ann Arbor, MI 48109 (USA) | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering University of Michigan Ann Arbor, MI 48109 (USA) | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering University of Michigan Ann Arbor, MI 48109 (USA) | en_US |
dc.contributor.affiliationother | Department of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA) | en_US |
dc.contributor.affiliationother | Department of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA) | en_US |
dc.contributor.affiliationother | Department of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA) | en_US |
dc.contributor.affiliationother | Department of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA) | en_US |
dc.contributor.affiliationother | Department of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA) | en_US |
dc.contributor.affiliationother | Department of Physics and Department of Materials Science and Engineering University of California Berkeley, CA 94720 (USA) | en_US |
dc.contributor.affiliationother | Department of Physics and Department of Materials Science and Engineering University of California Berkeley, CA 94720 (USA) | en_US |
dc.contributor.affiliationother | Department of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA) ; Department of Materials Science and Engineering University of Wisconsin Madison, WI 53706 (USA). | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/61869/1/817_ftp.pdf | |
dc.identifier.doi | 10.1002/adma.200800823 | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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