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Lithographically Micromachined Si/Glass Heat Exchangers for Joule-Thomson Coolers.

dc.contributor.authorZhu, Weibinen_US
dc.date.accessioned2009-05-15T15:25:42Z
dc.date.availableNO_RESTRICTIONen_US
dc.date.available2009-05-15T15:25:42Z
dc.date.issued2009en_US
dc.date.submitteden_US
dc.identifier.urihttps://hdl.handle.net/2027.42/62436
dc.description.abstractMicromachined Joule-Thomson (J-T) coolers have applications ranging from cryosurgery to cooling infrared detectors. With the absence of cold moving parts, the J-T coolers can be implemented with simple structures that are suitable for silicon/glass microfabrication. The investigation proposed in this thesis focuses on the development of micromachined Si/glass heat exchangers used in the J-T coolers that operate at 200-225K when the gas pressure is 1-2MPa. The heat exchangers must maintain good stream-to-stream heat conductance between the high- and low-pressure streams while restricting stream-wise conduction to achieve a high effectiveness. Two heat exchangers were designed, fabricated and tested. The first, a planar design, uses rows of high-conductivity silicon fins bonded onto a 100µm thick low-conductivity glass base plate. It was fabricated using a five-mask process including Si/glass/Si anodic bonding, two-step DRIE, and HF glass etching, etc. The second, a perforated-plate design, uses numerous silicon plates alternated with glass spacers. It was fabricated using a four-mask process including KOH on (110) silicon wafers, HF glass etching and anodic bonding. Platinum resistance temperature detectors were integrated into the heat exchanger for in-situ temperature sensing. Whereas the performance of the planar heat exchanger was limited by its ability to accommodate a pressure differential across the base plate, the perforated-plate heat exchangers demonstrated a high effectiveness (0.912) in at 237-252K in effectiveness tests and good robustness at high pressures (1MPa) in J-T self-cooling tests. The temperature distribution along the heat exchanger was measured by integrated resistance temperature detectors with sensitivities of 0.26-0.30%/K at 205-296K. A J-T system using the perforated-plate heat exchanger achieved 218.7K at steady state and 200.3K in a transient state. The system provided 200mW cooling power at 228K and 1W at 239K with an estimated parasitic heat load of 300-500mW. Finally, a flow-controlled J-T system using a perforated-plate heat exchanger and a piezoelectric microvalve was demonstrated. By modulating the flow, the microvalve could vary the cooling temperature by 5-8K around the operating points, which were 254.5K at 430kPa pressure difference in steady state, and 234K at 710kPa in transient state, without an added heat load.en_US
dc.format.extent28103726 bytes
dc.format.extent1373 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_USen_US
dc.subjectHeat Exchangeren_US
dc.subjectJoule-Thomson Cooleren_US
dc.subjectMEMSen_US
dc.subjectCryosurgeryen_US
dc.subjectIn-Situ Temperature Sensingen_US
dc.subjectFlow Modulationen_US
dc.titleLithographically Micromachined Si/Glass Heat Exchangers for Joule-Thomson Coolers.en_US
dc.typeThesisen_US
dc.description.thesisdegreenamePhDen_US
dc.description.thesisdegreedisciplineMechanical Engineeringen_US
dc.description.thesisdegreegrantorUniversity of Michigan, Horace H. Rackham School of Graduate Studiesen_US
dc.contributor.committeememberGianchandani, Yogesh B.en_US
dc.contributor.committeememberBernal, Luis P.en_US
dc.contributor.committeememberKurabayashi, Katsuoen_US
dc.contributor.committeememberNellis, Gregory F.en_US
dc.contributor.committeememberYoon, Euisiken_US
dc.subject.hlbsecondlevelElectrical Engineeringen_US
dc.subject.hlbsecondlevelMechanical Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/62436/1/zhuwb_1.pdf
dc.owningcollnameDissertations and Theses (Ph.D. and Master's)


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