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Self-Assembly of Ordered Semiconductor Nanoholes by Ion Beam Sputtering
dc.contributor.authorWei, Qiangminen_US
dc.contributor.authorZhou, Xiulien_US
dc.contributor.authorJoshi, Bhuwanen_US
dc.contributor.authorChen, Yanbinen_US
dc.contributor.authorLi, Kun-Daren_US
dc.contributor.authorWei, Qihuoen_US
dc.contributor.authorSun, Kaien_US
dc.contributor.authorWang, Luminen_US
dc.date.accessioned2009-08-12T15:33:54Z
dc.date.available2010-09-01T19:24:05Zen_US
dc.date.issued2009-07-27en_US
dc.identifier.citationWei, Qiangmin; Zhou, Xiuli; Joshi, Bhuwan; Chen, Yanbin; Li, Kun-Dar; Wei, Qihuo; Sun, Kai; Wang, Lumin (2009). "Self-Assembly of Ordered Semiconductor Nanoholes by Ion Beam Sputtering." Advanced Materials 21(28): 2865-2869. <http://hdl.handle.net/2027.42/63530>en_US
dc.identifier.issn0935-9648en_US
dc.identifier.issn1521-4095en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/63530
dc.description.abstractNo Abstract.en_US
dc.format.extent811882 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.publisherWILEY-VCH Verlagen_US
dc.subject.otherChemistryen_US
dc.subject.otherPolymer and Materials Scienceen_US
dc.titleSelf-Assembly of Ordered Semiconductor Nanoholes by Ion Beam Sputteringen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelEngineering (General)en_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering University of Michigan Ann Arbor, MI 48109 (USA)en_US
dc.contributor.affiliationumDepartment of Nuclear Engineering and Radiological Science University of Michigan Ann Arbor, MI 48109 (USA)en_US
dc.contributor.affiliationumDepartment of Nuclear Engineering and Radiological Science University of Michigan Ann Arbor, MI 48109 (USA)en_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering University of Michigan Ann Arbor, MI 48109 (USA)en_US
dc.contributor.affiliationumDepartment of Nuclear Engineering and Radiological Science University of Michigan Ann Arbor, MI 48109 (USA) ; Department of Nuclear Engineering and Radiological Science University of Michigan Ann Arbor, MI 48109 (USA).en_US
dc.contributor.affiliationotherSchool of Physical Electronics University of Electronic Science and Technology of China Chengdu 610054 (P. R. China)en_US
dc.contributor.affiliationotherDepartment of Chemical Physics Kent State University Kent, OH 44242 (USA)en_US
dc.contributor.affiliationotherDepartment of Chemical Physics Kent State University Kent, OH 44242 (USA)en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/63530/1/2865_ftp.pdf
dc.identifier.doi10.1002/adma.200803258en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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