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Laue transmission diffraction optics for thin film stress calculation
dc.contributor.authorFrench, B. L.en_US
dc.contributor.authorBilello, John C.en_US
dc.date.accessioned2010-05-06T20:47:51Z
dc.date.available2010-05-06T20:47:51Z
dc.date.issued2003-07-01en_US
dc.identifier.citationFrench, B. L.; Bilello, J. C. (2003). "Laue transmission diffraction optics for thin film stress calculation." Journal of Applied Physics 94(1): 224-230. <http://hdl.handle.net/2027.42/69565>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/69565
dc.description.abstractWhite beam Laue transmission diffraction topography has been used to determine the curvature of a crystalline substrate, from which the stress in the overlaying coating is determined. A detailed analytical method has been developed which correlates the introduction of curvature to the substrate in two orthogonal directions with attendant changes in the dimensions of a given topographic reflection. The size of a given reflection is found to depend on the dimensions of the incident beam, the horizontal and vertical incident beam divergences, the orthogonal curvatures of the crystalline substrate, the camera length, and the indices of the selected reflection. The thermal tests of sputtered polycrystalline Ta and Cr films on Si (100)Si (100) substrates are used to demonstrate the applicability of this phenomenon. Simultaneous observation of film delamination and quantification of associated stresses is shown to be possible. © 2003 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent311217 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleLaue transmission diffraction optics for thin film stress calculationen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, Center for Nanomaterials Science, University of Michigan, Ann Arbor, Michigan 48109-2136en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/69565/2/JAPIAU-94-1-224-1.pdf
dc.identifier.doi10.1063/1.1580191en_US
dc.identifier.sourceJournal of Applied Physicsen_US
dc.identifier.citedreferenceH. Windischmann, CRC Crit. Rev. Solid State Mater. Sci. CCRSDA17, 547 (1992).en_US
dc.identifier.citedreferenceZ. B. Zhao, Z. U. Rek, and J. C. Bilello, Philos. Trans. R. Soc. London, Ser. A PTRMAD357, 2681 (1999).en_US
dc.identifier.citedreferenceZ. B. Zhao, J. Hershberger, A. Chiaramonti, Z. U. Rek, and J. C. Bilello, Mater. Res. Soc. Symp. Proc. MRSPDH524, 81 (1998).en_US
dc.identifier.citedreferenceA. Guinier and J. Tennevin, Acta Crystallogr. ACCRA92, 133 (1949).en_US
dc.identifier.citedreferenceA. Guinier and J. Tennevin, Progress in Metal Physics (Interscience, New York, 1950), Vol. 2, p. 177.en_US
dc.identifier.citedreferenceP. Suortti, U. Lienert, and C. Schulze, Nucl. Instrum. Methods Phys. Res. A NIMAER338, 27 (1994).en_US
dc.identifier.citedreferenceV. V. Kvardakov, V. A. Somenkov, J. W. Lynn, D. F. R. Mildner, and H. Chen, Physica B PHYBE3241-243, 1210 (1998).en_US
dc.identifier.citedreferenceV. V. Aristov, Yu. A. Basov, G. N. Kulipanov, V. F. Pindyurin, A. A. Snigirev, and A. S. Sokolov, Nucl. Instrum. Methods Phys. Res. A NIMAER274, 390 (1989).en_US
dc.identifier.citedreferenceC. L. Kuo, P. E. Vanier, and J. C. Bilello, J. Appl. Phys. JAPIAU55, 375 (1984).en_US
dc.identifier.citedreferenceZ. B. Zhao, J. Hershberger, Z. U. Rek, and J. C. Bilello, Mater. Res. Soc. Symp. Proc. MRSPDH502, 163 (1998).en_US
dc.identifier.citedreferenceC. Cabral, Jr., L. A. Clevenger, and R. G. Shad, Mater. Res. Soc. Symp. Proc. MRSPDH308, 57 (1993).en_US
dc.identifier.citedreferenceG. G. Stoney, Proc. R. Soc. London, Ser. A PRLAAZ82, 172 (1909).en_US
dc.identifier.citedreferenceD. W. Hoffman, in Physics of Thin Films, edited by G. Haas and R. E. Thun (Academic, New York, 1965), Vol. 3, p. 211.en_US
dc.identifier.citedreferenceC. V. Thompson and R. Carel, J. Mech. Phys. Solids JMPSA844, 657 (1996).en_US
dc.identifier.citedreferenceD. W. Hoffman and J. A. Thornton, Thin Solid Films THSFAP40, 355 (1977).en_US
dc.identifier.citedreferenceR. Gontarz and T. Lucinsk, J. Magn. Magn. Mater. JMMMDC101, 253 (1991).en_US
dc.identifier.citedreferenceB. D. Cullity, Elements of X-ray Diffraction, 2nd ed. (Addison-Wesley, Reading, MA, 1978), p. 292.en_US
dc.owningcollnamePhysics, Department of


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