Transition from lateral to transverse phase separation during film co‐deposition
dc.contributor.author | Adams, C. D. | en_US |
dc.contributor.author | Atzmon, Michael | en_US |
dc.contributor.author | Cheng, Y. ‐t. | en_US |
dc.contributor.author | Srolovitz, David J. | en_US |
dc.date.accessioned | 2010-05-06T21:36:53Z | |
dc.date.available | 2010-05-06T21:36:53Z | |
dc.date.issued | 1991-11-11 | en_US |
dc.identifier.citation | Adams, C. D.; Atzmon, M.; Cheng, Y.‐T.; Srolovitz, D. J. (1991). "Transition from lateral to transverse phase separation during film co‐deposition." Applied Physics Letters 59(20): 2535-2537. <http://hdl.handle.net/2027.42/70088> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/70088 | |
dc.description | Copyright 1991 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The article originally appeared in Applied Physics Letters 59, 2535 (1991) and may be found at http://apl.aip.org/resource/1/applab/v59/i20/p2535_s1. | |
dc.description.abstract | We report observations of two distinct types of phase‐separated microstructures in co‐deposited Al‐Ge films. In the initial stages of growth, lateral phase separation is observed, with a temperature dependence consistent with surface diffusion. As the film grows thicker, the Ge‐rich phase becomes increasingly buried, and a transverse phase‐separated microstructure results, consisting of an Al‐rich layer covering a Ge‐rich layer. This observation is explained in terms of the competition between surface and interfacial free energies. We discuss the kinetic aspects of the phase separation process, and the resulting behavior in the thick‐film limit. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 505938 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Transition from lateral to transverse phase separation during film co‐deposition | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationum | Department of Nuclear Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationum | General Motors Research Laboratories, Physical Chemistry Dept., Warren, Michigan 48090‐9055 | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/70088/2/APPLAB-59-20-2535-1.pdf | |
dc.identifier.doi | 10.1063/1.105944 | en_US |
dc.identifier.source | Applied Physics Letters | en_US |
dc.identifier.citedreference | C. D. Adams, M. Atzmon, Y.-T. Cheng, and D. J. Srolovitz, in Thin Film Structures and Phase Stability, edited by B. M. Clemens and W. L. Johnson, Mater. Res. Soc. Symp. Proa, Vol. 187 (Materials Research Society, Pittsburgh, 1990), p. 33. | en_US |
dc.identifier.citedreference | M. Atzmon, C. D. Adams, Y.-T. Cheng, and D. J. Srolovitz, in Evolution of Thin Film and Surface Microstructure, edited by C. V. Thompson, J. Y. Tsao, arid D. J. Srolovitz, Mater. Res. Soc. Symp. Proa, Vol. 202 (Materials Research Society, Pittsburgh, 1991), p. 143. | en_US |
dc.identifier.citedreference | Binary Alloy Phase Diagrams, edited by T. B. Massalski (ASM, Metals Park, 1986), p. 116. | en_US |
dc.identifier.citedreference | B. Dwir and G. Deutscher, in Proceedings of International Workshop on Novel Mechanism of Superconductivity, edited by S. A. Wolf and V. Z. Kresin (Plenum, NY, 1987), p. 23. | en_US |
dc.identifier.citedreference | S. S. Lau and W. F. van der Wege, in Thin Films—Interdiffusion and Reactions, edited by J. M. Poate, K. N. Tu, and J. W. Mayer (Wiley, New York, 1978), p. 433. | en_US |
dc.identifier.citedreference | W. W. Mullins and R. F. Sekerka, J. Appl. Phys. 34, 323 (1963); 35, 444 (1964). | en_US |
dc.owningcollname | Physics, Department of |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.