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Interfacial and surface energetics of CoSi2
dc.contributor.authorAdams, David P.en_US
dc.contributor.authorYalisove, Steven M.en_US
dc.contributor.authorEaglesham, D. J.en_US
dc.date.accessioned2010-05-06T22:21:01Z
dc.date.available2010-05-06T22:21:01Z
dc.date.issued1994-11-01en_US
dc.identifier.citationAdams, D. P.; Yalisove, S. M.; Eaglesham, D. J. (1994). "Interfacial and surface energetics of CoSi2." Journal of Applied Physics 76(9): 5190-5194. <http://hdl.handle.net/2027.42/70558>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70558
dc.description.abstractThe energetics of the CoSi2‐Si interface and the CoSi2 surface have been investigated by analyzing the equilibrium shapes of isolated silicide precipitates. CoSi2 precipitates grown by heating 2 Å of Co on a clean, reconstructed Si{100} surface formed with a number of orientations that remained stable upon annealing to high temperatures. Precipitates buried by a Si capping layer were shown to form along {111} and {100} interfaces. A ratio of the CoSi2‐Si interfacial free energies has been measured from the shapes of a large number of buried precipitates indicating that γ{100}/γ{111}=1.43±0.07. It is suggested that the shape of CoSi2 equilibrated within vacuum consists of {111}, {100}, and {110} facets.en_US
dc.format.extent3102 bytes
dc.format.extent867012 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleInterfacial and surface energetics of CoSi2en_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, University of Michigan, 2300 Hayward Street, Ann Arbor, Michigan 48109‐2136en_US
dc.contributor.affiliationotherAT&T Bell Laboratories, Murray Hill, New Jersey 07974en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70558/2/JAPIAU-76-9-5190-1.pdf
dc.identifier.doi10.1063/1.357237en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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