Characteristics of dislocations at strained heteroepitaxial InGaAs/GaAs interfaces
dc.contributor.author | Chang, Kevin H. | en_US |
dc.contributor.author | Bhattacharya, Pallab K. | en_US |
dc.contributor.author | Gibala, Ronald | en_US |
dc.date.accessioned | 2010-05-06T23:05:31Z | |
dc.date.available | 2010-05-06T23:05:31Z | |
dc.date.issued | 1989-10-01 | en_US |
dc.identifier.citation | Chang, Kevin H.; Bhattacharya, Pallab K.; Gibala, Ronald (1989). "Characteristics of dislocations at strained heteroepitaxial InGaAs/GaAs interfaces." Journal of Applied Physics 66(7): 2993-2998. <http://hdl.handle.net/2027.42/71028> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/71028 | |
dc.description.abstract | The formation, interaction, and propagation of misfit dislocations in molecular‐beam epitaxial InGaAs/GaAs heterointerfaces have been studied by transmission electron microscopy. With the lattice mismatch less than 2%, most of the interfacial dislocations are found to be 60° mixed dislocations introduced by glide processes. Sessile edge‐type dislocations can also originate from the combination of two 60° mixed dislocations. The ratio of densities of edge dislocations to 60° dislocations was increased during the later part of the elastic strain relaxation. These sessile edge dislocations may be generated in appreciable numbers through a climb process. For large lattice‐mismatched systems, the majority of the misfit dislocations are pure edge dislocations and high threading dislocation density is generally found. The interfacial dislocation network is found to contain regions of dislocations with the same Burgers vector that extend over several micrometers. The results support a mechanism that involves misfit dislocation multiplication during the molecular‐beam epitaxial growth process. | en_US |
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dc.format.extent | 1686075 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/octet-stream | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Characteristics of dislocations at strained heteroepitaxial InGaAs/GaAs interfaces | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationum | Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.contributor.affiliationum | Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/71028/2/JAPIAU-66-7-2993-1.pdf | |
dc.identifier.doi | 10.1063/1.344183 | en_US |
dc.identifier.source | Journal of Applied Physics | en_US |
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dc.owningcollname | Physics, Department of |
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