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Phase separation during co-deposition of Al-Ge thin films
dc.contributor.authorAdams, C. D.en_US
dc.contributor.authorAtzmon, Michaelen_US
dc.contributor.authorCheng, Y. -T.en_US
dc.contributor.authorSrolovitz, David J.en_US
dc.date.accessioned2011-03-31T20:58:56Z
dc.date.accessioned2011-03-31T20:58:56Z
dc.date.available2011-03-31T20:58:56Zen_US
dc.date.issued1992en_US
dc.identifier.citationC. D. Adams, M. Atzmon, Y.-T. Cheng and D. J. Srolovitz, "Phase separation during co-deposition of Al-Ge thin films," Journal of Materials Research 7, 653 (1992). <http://hdl.handle.net/2027.42/83402>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/83402
dc.publisherMaterials Research Societyen_US
dc.rights© 1992 Materials Research Societyen_US
dc.titlePhase separation during co-deposition of Al-Ge thin filmsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelNuclear Engineering and Radiological Sciencesen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumMaterials Science and Engineering; Nuclear Engineering and Radiological Sciencesen_US
dc.contributor.affiliationotherPhysical Chemistry Department, General Motors Research Laboratories, Warren, Michigan 48090-9055en_US
dc.identifier.pmid10046170en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/83402/1/Adams_JMR.pdf
dc.identifier.sourceJournal of Materials Researchen_US
dc.owningcollnameNuclear Engineering and Radiological Sciences, Department of (NERS)


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